Acta Photonica Sinica, Volume. 44, Issue 9, 922004(2015)
Continuous Microstructure Etching Process Polyimide Based Moving Mask Exposure
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XIE Yu-ping, WU Peng, YANG Zheng, YIN Shao-yun, DU Chun-lei, DONG Lian-he. Continuous Microstructure Etching Process Polyimide Based Moving Mask Exposure[J]. Acta Photonica Sinica, 2015, 44(9): 922004
Received: Apr. 1, 2015
Accepted: --
Published Online: Oct. 22, 2015
The Author Email: Yu-ping XIE (xieyuping@cigit.ac.cn)