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Acta Photonica Sinica, Volume. 44, Issue 9, 922004(2015)

Continuous Microstructure Etching Process Polyimide Based Moving Mask Exposure

XIE Yu-ping1...2,3,*, WU Peng2,3, YANG Zheng2,3, YIN Shao-yun2,3, DU Chun-lei2,3 and DONG Lian-he1 |Show fewer author(s)
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  • 1[in Chinese]
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  • 3[in Chinese]
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    XIE Yu-ping, WU Peng, YANG Zheng, YIN Shao-yun, DU Chun-lei, DONG Lian-he. Continuous Microstructure Etching Process Polyimide Based Moving Mask Exposure[J]. Acta Photonica Sinica, 2015, 44(9): 922004

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    Paper Information

    Received: Apr. 1, 2015

    Accepted: --

    Published Online: Oct. 22, 2015

    The Author Email: Yu-ping XIE (xieyuping@cigit.ac.cn)

    DOI:10.3788/gzxb20154409.0922004

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology