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Acta Optica Sinica, Volume. 26, Issue 8, 1192(2006)

Novel Optimization Algorithm for Dose Control Parameters in Step and Scan Lithography

[in Chinese]1,2、* and [in Chinese]1,2
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  • 2[in Chinese]
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    [in Chinese], [in Chinese]. Novel Optimization Algorithm for Dose Control Parameters in Step and Scan Lithography[J]. Acta Optica Sinica, 2006, 26(8): 1192

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    Paper Information

    Category: Lasers and Laser Optics

    Received: Jul. 5, 2005

    Accepted: --

    Published Online: Mar. 15, 2007

    The Author Email: (shyliu@mail.hust.edu.cn)

    DOI:

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology