Acta Optica Sinica, Volume. 35, Issue 6, 622005(2015)
Simulation Model Based on Equivalent Layer Method for Defective Mask Multilayer in Extremeultra violet Lithography
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Liu Xiaolei, Li Sikun, Wang Xiangzhao. Simulation Model Based on Equivalent Layer Method for Defective Mask Multilayer in Extremeultra violet Lithography[J]. Acta Optica Sinica, 2015, 35(6): 622005
Category: Optical Design and Fabrication
Received: Dec. 31, 2014
Accepted: --
Published Online: May. 20, 2015
The Author Email: Xiaolei Liu (liuxl@siom.ac.cn)