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Acta Optica Sinica, Volume. 35, Issue 6, 622005(2015)

Simulation Model Based on Equivalent Layer Method for Defective Mask Multilayer in Extremeultra violet Lithography

Liu Xiaolei1,2、*, Li Sikun1,2, and Wang Xiangzhao1
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    Article index updated:May. 20, 2024

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    Liu Xiaolei, Li Sikun, Wang Xiangzhao. Simulation Model Based on Equivalent Layer Method for Defective Mask Multilayer in Extremeultra violet Lithography[J]. Acta Optica Sinica, 2015, 35(6): 622005

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    Paper Information

    Category: Optical Design and Fabrication

    Received: Dec. 31, 2014

    Accepted: --

    Published Online: May. 20, 2015

    The Author Email: Xiaolei Liu (liuxl@siom.ac.cn)

    DOI:10.3788/aos201535.0622005

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology