Design and fabrication of a SiN-Si dual-layer optical phased array chip

Pengfei Wang; Guangzhen Luo; Yang Xu; Yajie Li; Yanmei Su; Jianbin Ma; Ruiting Wang; Zhengxia Yang; Xuliang Zhou; Yejin Zhang; Jiaoqing Pan

doi:10.1364/PRJ.387376

Photonics Research, Volume. 8, Issue 6, 912(2020)

Design and fabrication of a SiN-Si dual-layer optical phased array chip

Pengfei Wang^1,2, Guangzhen Luo^1,2, Yang Xu³, Yajie Li^1,2, Yanmei Su^1,2, Jianbin Ma^1,2, Ruiting Wang^1,2, Zhengxia Yang^1,2, Xuliang Zhou^1,2, Yejin Zhang^1,2, and Jiaoqing Pan^1,2、*

Author Affiliations

¹Key Laboratory of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China

²Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China

³Beijing R&D Institute, VanJee Technology, Beijing 100193, China

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Supplementary Materials

Visualization 1 | The far-field test system can accurately measure the spot size, and a small range of scanning (± 20 °).

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Visualization 2 | A scanning range of 96° was measured by the scanning test system.

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Pengfei Wang, Guangzhen Luo, Yang Xu, Yajie Li, Yanmei Su, Jianbin Ma, Ruiting Wang, Zhengxia Yang, Xuliang Zhou, Yejin Zhang, Jiaoqing Pan. Design and fabrication of a SiN-Si dual-layer optical phased array chip[J]. Photonics Research, 2020, 8(6): 912

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Paper Information

Category: Silicon Photonics

Received: Jan. 15, 2020

Accepted: Apr. 2, 2020

Published Online: May. 19, 2020

The Author Email: Jiaoqing Pan (jqpan@semi.ac.cn)

DOI:10.1364/PRJ.387376

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology