<trans-title>Sputtering Power on the Microstructure and Properties of MgF<sub>2</sub> Thin Films Prepared with Magnetron Sputtering</trans-title>

Changjiang ZHAO; Chao MA; Juncheng LIU; Zhigang LIU; Yan CHEN

doi:10.15541/jim200190565

Journal of Inorganic Materials, Volume. 35, Issue 9, 1064(2020)

Sputtering Power on the Microstructure and Properties of MgF₂ Thin Films Prepared with Magnetron Sputtering

Changjiang ZHAO^1,2,3, Chao MA^1,2, Juncheng LIU^1,2、*, Zhigang LIU³, and Yan CHEN³

Author Affiliations

¹School of Materials Science and Engineering, TIANGONG University, Tianjin 300387, China

²State Key Laboratory of Membrane Separation and Membrane Process, Tianjin 300387, China

³Beijing Institute of Spacecraft System Engineering, Beijing 100086, China

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Figures & Tables(8)

1. Effect of sputtering power on XPS spectrum of MgF₂film

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2. Effect of sputtering power on XRD pattern of MgF₂ thin film

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3. Effect of sputtering power on the surface micro morphology of MgF₂ film

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$Effect of sputtering power on refractive index spectra of MgF2 thin film$

4. Effect of sputtering power on refractive index spectra of MgF₂ thin film

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5. Effect of sputtering power on transmission spectra of MgF₂ thin film

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$Relation between integrated transmittance within 300-1100 nm and refractive index of thin film at 550 nm$

6. Relation between integrated transmittance within 300-1100 nm and refractive index of thin film at 550 nm

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Table 1.
Molar ratio of F to Mg and XRD analysis results of MgF₂ films

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Table 1.
Molar ratio of F to Mg and XRD analysis results of MgF₂ films

Sample	n(F) : n(Mg)	2θ/(°)	Intensity/(a.u.)	FWHM	Interplanar spacing/nm	Grain size/nm
115 W	1.65	57.832	127	0.95	0.1593	9.6
150 W	1.88	56.447	36086	0.534	0.1629	17.2
185 W	2.02	56.968	158	0.874	0.1615	10.4
220 W	2.44	Amorphous	-	-	-	-

Table 2.
Thickness, refractive index and integral transmittance of MgF₂ film

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Table 2.
Thickness, refractive index and integral transmittance of MgF₂ film

Sputtering power/W	Thickness/nm	Refractive index within 300-1100 nm	Refractive index at 550 nm	Integral transmittancewithin 300-1100 nm/%
115	65	1.525-1.494	1.501	92.489
150	63	1.483-1.452	1.459	93.433
185	67	1.408-1.377	1.384	94.990
220	76	1.508-1.477	1.484	92.925
Glass	0		1.46	93.20

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Changjiang ZHAO, Chao MA, Juncheng LIU, Zhigang LIU, Yan CHEN. Sputtering Power on the Microstructure and Properties of MgF₂ Thin Films Prepared with Magnetron Sputtering[J]. Journal of Inorganic Materials, 2020, 35(9): 1064

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Paper Information

Category: RESEARCH LETTERS

Received: Nov. 6, 2019

Accepted: --

Published Online: Mar. 3, 2021

The Author Email: LIU Juncheng (jchliu@tjpu.edu.cn)

DOI:10.15541/jim200190565

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology

Table 1. Molar ratio of F to Mg and XRD analysis results of MgF2 films

Table 1. Molar ratio of F to Mg and XRD analysis results of MgF2 films

Table 2. Thickness, refractive index and integral transmittance of MgF2 film

Table 2. Thickness, refractive index and integral transmittance of MgF2 film

Table 1.
Molar ratio of F to Mg and XRD analysis results of MgF₂ films

Table 1.
Molar ratio of F to Mg and XRD analysis results of MgF₂ films

Table 2.
Thickness, refractive index and integral transmittance of MgF₂ film

Table 2.
Thickness, refractive index and integral transmittance of MgF₂ film