Optics and Precision Engineering, Volume. 28, Issue 9, 1924(2020)

Preparation of ScAlN thin film through reactive magnetron sputtering

CHEN Yu-xin1...2,*, LIU Yu-fei1,2, and SHANG Zheng-guo12 |Show fewer author(s)
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    References(5)

    [6] [6] AKIYAMA M, KAMOHARA T, KANO K, et al.. Enhancement of piezoelectric response in scandium aluminum nitride alloy thin films prepared by dual reactive cosputtering [J]. Advanced Materials, 2009, 21(5): 593-596.

    [7] [7] DUBOIS M A, MURALT P. Stress and piezoelectric properties of aluminum nitride thin films deposited onto metal electrodes by pulsed direct current reactive sputtering [J]. Journal of Applied Physics, 2001, 89(11): 6389.

    [8] [8] FICHTNER S, WOLFF N, KRISHNAMURTHY G, et al.. Identifying and overcoming the interface originating c-axis instability in highly Sc enhanced AlN for piezoelectric micro-electromechanical systems [J]. Journal of Applied Physics, 2017, 122(3): 1051-276.

    [9] [9] KAMOHARA T, AKIYAMA M, UENO N, et al.. Growth of highly c-axis-oriented aluminum nitride thin films on molybdenum electrodes using aluminum nitride interlayers [J]. Journal of Crystal Growth, 2005, 275(3-4): 383-388.

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    CHEN Yu-xin, LIU Yu-fei, SHANG Zheng-guo. Preparation of ScAlN thin film through reactive magnetron sputtering[J]. Optics and Precision Engineering, 2020, 28(9): 1924

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    Paper Information

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    Received: Feb. 11, 2020

    Accepted: --

    Published Online: Dec. 28, 2020

    The Author Email: Yu-xin CHEN (20133013@cqu.edu.cn)

    DOI:10.37188/ope.20202809.1924

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