[1] K X WANG, Z YU, S SANDHU et al. Condition for perfect antireflection by optical resonance at material interface. Optica, 1, 388-395(2014).

[2] Xiaobin DONG, Tianfeng ZHOU, Yupeng HE et al. Research on micro-nano structure machining and property manipulation of the structural color surface. Journal of Mechanical Engineering, 59, 239-245(2021).

[3] D WANG, Q SUN, M J HOKKANEN et al. Design of robust superhydrophobic surfaces. Nature, 582, 55-59(2020).

[4] X LIU, K LI, J SHEN et al. Hot embossing of moth eye-like nanostructure array on transparent glass with enhanced antireflection for solar cells. Ceramics International, 47, 18367-18375(2021).

[5] G TAN, J H LEE, Y H LAN et al. Broadband antireflection film with moth-eye-like structure for flexible display applications. Optica, 4, 678-683(2017).

[6] H LAN, H LIU. UV-nanoimprint lithography: structure, materials and fabrication of flexible molds. Journal of Nanoscience and Nanotechnology, 13, 3145-3172(2013).

[7] W SHAO, H LIANG. Challenges and solutions of lithography. Fine and Specialty Chemicals, 29, 1-4(2021).

[8] S OKAZAKI. High resolution optical lithography or high throughput electron beam lithography: the technical struggle from the micro to the nano-fabrication evolution. Microelectronic Engineering, 133, 23-35(2015).

[9] S Y CHOU, P R KRAUSS, P J RENSTROM. Imprint of sub-25 nm vias and trenches in polymers. Applied Physics Letters, 67, 3114-3116(1995).

[10] J SCHOOT, H SCHIFT. Next-generation lithography⁃an outlook on EUV projection and nanoimprint. Advanced Optical Technologies, 6, 159-162(2017).

[11] H MEKARU, M TAKAHASHI. Ultrasonic nanoimprint on engineering plastics at room temperature, 300-301(2007).

[12] H W YU, H L CHI, P G JUNG et al. Polymer microreplication using ultrasonic vibration energy. Journal of Micro/Nanopatterning, Materials, and Metrology, 8, 55-56(2009).

[13] H LUO, J YU, H LOU et al. Thermal/tribological effects of superimposed ultrasonic vibration on viscoelastic responses and mold-filling capacity of optical glass: A comparative study. Ultrasonics, 106234(2020).

[14] Y GU, S CHEN, J LIN et al. High-quality efficient anti-reflection nanopillar structures layer prepared by a new type vibration-assisted UV nanoimprint lithography. Journal of Manufacturing Processes, 61, 461-472(2021).

[15] Y GUO, L GANG, X ZHU et al. Analysis of the demolding forces during hot embossing. Microsystem Technologies, 13, 411-415(2007).