Study on the design and preparation technology of ultra-low profile wideband high reflection thin films

Jinlin Bai; Yugang Jiang; Lishuan Wang; Ziyang Li; Jiahuan He; Huasong Liu; Jianzhong Su

doi:10.3788/IRLA20200413

Infrared and Laser Engineering, Volume. 50, Issue 2, 20200413(2021)

Study on the design and preparation technology of ultra-low profile wideband high reflection thin films

Jinlin Bai^1,2, Yugang Jiang^1,2, Lishuan Wang^1,2, Ziyang Li^1,2, Jiahuan He^1,2, Huasong Liu^1,2, and Jianzhong Su^1,2

Author Affiliations

¹Tianjin Key Laboratory of Optical Thin Film, Tianjin Jinhang Institute of Technical Physics, Tianjin 300308, China

²Joint Laboratory of Optoelectronic Materials and Intelligent Surface Structures, Tianjin 300308, China

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References(1)

[10] C Eda, B Bill, Z Oleg, et al. Mechanical and thermoelastic characteristics of optical thin films deposited by dual ion beam sputtering. Applied Optics, 48, 4536-4544(2009).

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Jinlin Bai, Yugang Jiang, Lishuan Wang, Ziyang Li, Jiahuan He, Huasong Liu, Jianzhong Su. Study on the design and preparation technology of ultra-low profile wideband high reflection thin films[J]. Infrared and Laser Engineering, 2021, 50(2): 20200413

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Paper Information

Category: Materials and Thin films

Received: Oct. 26, 2020

Accepted: --

Published Online: Mar. 22, 2021

The Author Email:

DOI:10.3788/IRLA20200413

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology