Infrared and Laser Engineering, Volume. 50, Issue 2, 20200413(2021)
Study on the design and preparation technology of ultra-low profile wideband high reflection thin films
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Table 1. [in Chinese]
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Materials Modulus/GPa Hardness/GPa Poisson’s ratio/GPa SiO2 64 8.7 0.14 Ta2O5 116 9.6 0.29 Fused silica 69 9.7 0.17
Table 2. [in Chinese]
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Materials Residual stress/GPa Thermal stress/GPa Intrinsic stress/GPa SiO2 −0.26 −4.61E-04 −0.262 Ta2O5 −0.226 −0.83E-03 −0.224
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Jinlin Bai, Yugang Jiang, Lishuan Wang, Ziyang Li, Jiahuan He, Huasong Liu, Jianzhong Su. Study on the design and preparation technology of ultra-low profile wideband high reflection thin films[J]. Infrared and Laser Engineering, 2021, 50(2): 20200413
Paper Information
Category: Materials and Thin films
Received: Oct. 26, 2020
Accepted: --
Published Online: Mar. 22, 2021
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