[1] [1] B. H. John. Optical lithography: 40 years and holding [C]. SPIE, 2007, 6520: 652004

[2] [2] Liu Fei, Li Yangqi. Design of high numerical aperture projection objective for industrial extreme ultraviolet lithography[J]. Acta Optica Sinica, 2011, 31(2): 222003

[3] [3] M. Tomoyuki, O. Yasuhiro, M. W. David. The lithographic lens: its hidtory and evolution [C]. SPIE, 2006, 6154: 615403

[4] [4] Udo Dinger. Microlithography Project Objective and Projection Exposure Apparatus [P]. U.S.Patent U S20060198029.2006-9

[5] [5] Ma Bin, Li Lin, Chang Jun et al.. Refractive projection lens for 90 nm resolution lithography [J]. Acta Optica Sinica, 2009, 29(s2): 211～215

[6] [6] Chen Mingyong. Design of Objective for Digital Gray-Tone Lithography [D]. Sichuan: Sichuan University, 2007. 3～5

[7] [7] Kafai Lai, Alan E. Rosenbluth, Geng Han et al.. Modeling polarization for hyper-NA lithography tools and masks [C]. SPIE, 2007, 6520: 65200D

[8] [8] Xu Weicai. Optical Design and Imaging Performance Compensation for the Lithographic Lens [D]. Changchun: Changchun Institute of Optics, Fine Mechanics and Physics, China Academy of Sciences, 2011.5

[9] [9] Chi Zeying, Chen Wenjian. Applied Optics and Elements of Optical Design [M]. Nanjin: Southeast University Press, 2008. 54～55

[10] [10] Huang Lin. Research on Two kinds of Zoom Optical System Design [D]. Zhejiang: Zhejiang University, 2002. 15～33

[11] [11] Zhang Yimo. Applied Optics [M]. Beijng: Publishing House of Electronics Industry, 2010. 636～655

[12] [12] Liang Laishun. A rapid computing method zoom optical design [J]. Appl. Opt., 2004, 25(1): 17～20

[13] [13] J. M. Geary. Introduction to Lens Design [M]. U.S.: Willmann-Bell,Inc

[14] [14] Wang Zhijiang. Applied Optics Technical Handbook [M]. Beijing: China Machine Press, 2007. 518～550

[15] [15] Wang Zhijiang. Theory Elements of Optical Design [M]. Beijing: Science Press, 1985. 321～345

[16] [16] Yuan Xucang. Optical Design [M]. Beijing: Beigjing Institute of Technology Press, 1988. 80～81