[1] [1] JooWJ et al 2020 Metasurface-driven OLED displays beyond 10,000 pixels per inch Science 370 459–63

[2] [2] XuLH,OuQD,LiYQ,ZhangYB,ZhaoXD,XiangHY, Chen J D,ZhouL, Lee ST and Tang J X 2016 Microcavity-free broadband light outcoupling enhancement in flexible organic light-emitting diodes with nanostructured transparent metal–dielectric composite electrodes ACS Nano 10 1625–32

[3] [3] Pourdavoud N, Wang S, Mayer A, Hu T, Chen Y W, Marianovich A, Kowalsky W, Heiderhoff R, Scheer H C and Riedl T 2017 Photonic nanostructures patterned by thermal nanoimprint directly into organo-metal halide perovskites Adv. Mater. 29 1605003

[4] [4] WangCH,Fan Y, ShaoJY, YangZJ,SunJX,TianHM and Li X M 2021 Discretely-supported nanoimprint lithography for patterning the high-spatial-frequency stepped surface Nano Res. 14 2606–12

[5] [5] CaoT, LianM,LiuK,LouXC,GuoYMandGuoDM 2022 Wideband mid-infrared thermal emitter based on stacked nanocavity metasurfaces Int. J. Extrem. Manuf. 4 015402

[6] [6] Li P N, Dolado I, Alfaro-Mozaz F J, Casanova F, Hueso L E, Liu S, Edgar J H, Nikitin A Y, Vélez S and Hillenbrand R 2018 Infrared hyperbolic metasurface based on nanostructured van der Waals materials Science 359 892–6

[7] [7] Kuznetsov A I, Miroshnichenko A E, Brongersma M L, Kivshar Y S and Luk’Yanchuk B 2016 Optically resonant dielectric nanostructures Science 354 aag2472

[8] [8] WangCH,LaiDS,Fan Y, TianHM,LiXM,ChenXLand Shao J Y 2021 Nanoimprinting metal-containing nanoparticle-doped gratings to enhance the polarization of light-emitting chips by induced scattering Nanotechnology 32 235304

[9] [9] Wu GB,ZhuSY, PangSWandChanCH2022 Superheterodyne-inspired waveguide-integrated metasurfaces for flexible free-space light manipulation Nanophotonics 11 4499–514

[10] [10] FengB,ChenYF, SunD,YangZY, YangB,LiXandLiT 2021 Precision integration of grating-based polarizers onto focal plane arrays of near-infrared photovoltaic detectors for enhanced contrast polarimetric imaging Int. J. Extrem. Manuf. 3 035201

[11] [11] Tian W, Liu D, Cao F R and Li L 2017 Hybrid nanostructures for photodetectors Adv. Opt. Mater. 5 1600468

[12] [12] OhDK,LeeT, Ko B,BadloeT, OkJGandRho J2021 Nanoimprint lithography for high-throughput fabrication of metasurfaces Front. Optoelectron. 14 229–51

[13] [13] Zhu S Y, Wu G B, Pang S W and Chan C H 2022 Compact terahertz dielectric folded metasurface Adv. Opt. Mater. 10 2101663

[14] [14] ZhouPL,Yu HB,ZhongY, ZouWH,WangZDandLiuLQ 2020 Fabrication of waterproof artificial compound eyes with variable field of view based on the bioinspiration from natural hierarchical micro–nanostructures Nano-Micro Lett. 12 166

[15] [15] Ji D Y, Li T and Fuchs H 2020 Patterning and applications of nanoporous structures in organic electronics Nano Today 31 100843

[16] [16] So S and Rho J 2019 Designing nanophotonic structures using conditional deep convolutional generative adversarial networks Nanophotonics 8 1255–61

[17] [17] Ma Z B, Jiang C Y, Yuan W Z and He Y 2013 Large-scale patterning of hydrophobic silicon nanostructure arrays fabricated by dual lithography and deep reactive ion etching Nano-Micro Lett. 5 7–12

[18] [18] LeeYH,LeeTK,SongI,Yu H,LeeJ,Ko H,KwakSKand Oh J H 2016 Boosting the performance of organic optoelectronic devices using multiple-patterned plasmonic nanostructures Adv. Mater. 28 4976–82

[19] [19] Willson C G and Roman B J 2008 The future of lithography: SEMATECH Litho Forum 2008 ACS Nano 2 1323–8

[20] [20] Chen Y Q, Shu Z W, Zhang S, Zeng P, Liang H K, Zheng M J and Duan H G 2021 Sub-10 nm fabrication: methods and applications Int. J. Extrem. Manuf. 3 032002

[21] [21] Totzeck M, Ulrich W, G.hnermeier A and Kaiser W 2007 Pushing deep ultraviolet lithography to its limits Nat. Photon. 1 629–31

[22] [22] Zhu X L, Czolkos I, Johansson A, Nielsen T and Kristensen A 2021 Master origination by 248 nm DUV lithography for plasmonic color generation Appl. Phys. Lett. 118 141103

[23] [23] Thomas J 2007 Body sculpting Nat. Nanotechnol. 2

[24] [24] Yong J L, Yang Q, Huo J L, Hou X and Chen F 2022 Underwater gas self-transportation along femtosecond laser-written open superhydrophobic surface microchannels (<100 μm) for bubble/gas manipulation Int. J. Extrem. Manuf. 4 015002

[25] [25] Wierer J J Jr, David A and Megens M M 2009 III-nitride photonic-crystal light-emitting diodes with high extraction efficiency Nat. Photon. 3 163–9

[26] [26] LeungSF, ZhangQP, XiuF, Yu DL,HoJC,LiDD and Fan Z Y 2014 Light management with nanostructures for optoelectronic devices J. Phys. Chem. Lett. 5 1479–95

[27] [27] Kim S, Hyun S, Lee J, Lee K S, Lee W and Kim J K 2018 Anodized aluminum oxide/polydimethylsiloxane hybrid mold for roll-to-roll nanoimprinting Adv. Funct. Mater. 28 1800197

[28] [28] Cai Y J, Qin A J and Tang B Z 2017 Siloles in optoelectronic devices J. Mater. Chem. C 5 7375–89

[29] [29] Huang X H and Li T 2020 Recent progress in the development of molecular-scale electronics based on photoswitchable molecules J. Mater. Chem. C 8 821–48

[30] [30] Zhang J H, Li Y F, Zhang X M and Yang B 2010 Colloidal self-assembly meets nanofabrication: from two-dimensional colloidal crystals to nanostructure arrays Adv. Mater. 22 4249–69

[31] [31] LiJ,HuYX,Yu L,LiL,JiDY, LiLQ,HuWPandFuchsH 2021 Recent advances of nanospheres lithography in organic electronics Small 17 2100724

[32] [32] Weber D, Heimburger R, Hildebrand D, Junghans T, Schondelmaier G, Walther C and Schondelmaier D 2019 Use of beam-shaping optics for wafer-scaled nanopatterning in laser interference lithography Appl. Phys. A 125 307

[33] [33] Wu J,GengZX,XieYY, Fan ZY, SuY, XuCandChenHD 2019 The fabrication of nanostructures on polydimethylsiloxane by laser interference lithography Nanomaterials 9 73

[34] [34] CaiSX,SunYL,ChuHH,YangWG,Yu HBandLiuLQ 2021 Microlenses arrays: fabrication, materials, and applications Microsc. Res. Tech. 84 2784–806

[35] [35] Ahn S H and Guo L J 2009 Large-area roll-to-roll and roll-to-plate nanoimprint lithography: a step toward high-throughput application of continuous nanoimprinting ACS Nano 3 2304–10

[36] [36] Leitgeb M, Nees D, Ruttloff S, Palfinger U, G.tz J, Liska R, Belegratis M R and Stadlober B 2016 Multilength scale patterning of functional layers by roll-to-roll ultraviolet-light-assisted nanoimprint lithography ACS Nano 10 4926–41

[37] [37] Jeong B, Han H, Kim H H, Choi W K, Park Y J and Park C 2020 Polymer-assisted nanoimprinting for environment-and phase-stable perovskite nanopatterns ACS Nano 14 1645–55

[38] [38] Zhao Z J et al 2021 Large-area nanogap-controlled 3D nanoarchitectures fabricated via layer-by-layer nanoimprint ACS Nano 15 503–14

[39] [39] Sreenivasan S V 2017 Nanoimprint lithography steppers for volume fabrication of leading-edge semiconductor integrated circuits Microsyst. Nanoeng. 3 17075

[40] [40] Palmieri F, Adams J, Long B, Heath W, Tsiartas P and Willson C G 2007 Design of reversible cross-linkers for step and flash imprint lithography imprint resists ACS Nano 1 307–12

[41] [41] WangZ,ZhuSJ,ShanXY, Yuan ZX,CuiXGandTianPF 2021 Full-color micro-LED display based on a single chip with two types of InGaN/GaN MQWs Opt. Lett. 46 4358–61

[42] [42] Zhang H et al 2022 Monolithic GaN optoelectronic system on a Si substrate Appl. Phys. Lett. 121 181103

[43] [43] ChenWX,HuXH,NiZB,HanTQandLu XF2016State of strain in GaN material as derived by optical feedback measurement Optik 127 3976–8

[44] [44] Tan C L, Chen J Z, Wu X J and Zhang H 2018 Epitaxial growth of hybrid nanostructures Nat. Rev. Mater. 3 17089

[45] [45] Martin-Bragado I and Sarikov A 2016 Atomistic modeling of epitaxial growth of semiconductor materials Mater. Sci. Semicond. Process. 42 223–9

[46] [46] Chen F R et al 2022 Mass transfer techniques for large-scale and high-density microLED arrays Int. J. Extrem. Manuf. 4 042005

[47] [47] Guo L J 2007 Nanoimprint lithography: methods and material requirements Adv. Mater. 19 495–513

[48] [48] Schmitt H, Duempelmann P, Fader R, Rommel M, Bauer A J, Frey L, Brehm M and Kraft A 2012 Life time evaluation of PDMS stamps for UV-enhanced substrate conformal imprint lithography Microelectron. Eng. 98 275–8

[49] [49] HuX,WangHQ,ZhaiC,GeHXandCuiYS2016 Fabrication of metallic patterns on highly curved substrates via nanoimprint lithography in association with an etch-in process J. Mater. Chem. C 4 11104–9

[50] [50] WangCH,ShaoJY, LaiDS,TianHMandLiXM2019 Suspended-template electric-assisted nanoimprinting for hierarchical micro-nanostructures on a fragile substrate ACS Nano 13 10333–42

[51] [51] Zhao S Y, Song Y X, Liang H, Jin T T, Lin J J, Yue L, You T G, Wang C, Ou X and Wang S M 2020 Stress and strain analysis of Si-based III–V template fabricated by ion-slicing Chin. Phys. B 29 077303

[52] [52] BenJW et al 2019 Influence of dislocations on the refractive index of AlN by nanoscale strain field Nanoscale Res. Lett. 14 184

[53] [53] Myers D R 1991 Issues in the realization of strained-layer quantum well optoelectronic devices Opt. Quant. Electron. 23 S985–94

[54] [54] SongJ,DingZ,LiuXF, HuangZC,LiJW, WeiJM, Luo Z J, Wang J H and Guo X 2021 The effect of biaxial tensile strain on structure and photoelectric properties of Fe-doped GaN monolayer Comput. Mater. Sci. 197 110644

[55] [55] FuXW, NieHX,SunZP, FengM,ChenX,LiuC,LiuF, Yu D P and Liao Z M 2022 Bending strain effects on the optical and optoelectric properties of GaN nanowires Nano Res. 15 4575–81

[56] [56] Sonne M R, Smistrup K, Hannibal M, Thorborg J, N.rregaard J and Hattel J H 2015 Modeling and simulation of the deformation process of PTFE flexible stamps for nanoimprint lithography on curved surfaces J. Mater. Process. Technol. 216 418–29

[57] [57] Jeon S et al 2021 Rotating cylinder-assisted nanoimprint lithography for enhanced chemisorbable filtration complemented by molecularly imprinted polymers Small 17 2105733

[58] [58] Dickson M N, Tsao J, Liang E I, Navarro N I, Patel Y R and Yee A F 2017 Conformal reversal imprint lithography for polymer nanostructuring over large curved geometries J. Vac. Sci. Technol. B 35 021602

[59] [59] WangCH,ShaoJY, TianHM,LiXM,DingYCandLiBQ 2016 Step-controllable electric-field-assisted nanoimprint lithography for uneven large-area substrates ACS Nano 10 4354–63