Nanometrology is a precision measurement technology on the nanometer scale， and it is the basis for advanced nanomanufacturing technology. Traceability is the basic problem of nanometer measurement， and the development of nanometer measurement reference materials is the key link to realizing its metrological traceability and ensuring its uniformity and accuracy. To meet the new requirements of the traceability of nanometer measurement flattening value transmission， we developed three types of self-traceable gratings， including 1D212.8， 2D212.8， and 1D106.4 nm， based on the transition frequency of chromium， by atom lithography and soft X-ray interference technology. On the basis of the silicon line width structure based on multilayer film deposition technology， we explored a self-traceable measurement method of silicon line width based on the lattice constant of silicon. In terms of application， we calibrated scanning probe microscopes， scanning electron microscopes， and other high-precision measuring instruments based on the self-traceable gratings. The research results show that the self-traceable reference material and measurement method can shorten the nanometer metrological traceability chain in various precision instruments and processing technologies and that both offer robust support for advanced nanomanufacturing and a new generation of information technology.