Acta Optica Sinica, Volume. 41, Issue 7, 0731001(2021)

Study on Film Thickness Uniformity of Magnetron Sputtering System Based on Twin Target

Boyang Wei1、*, Dongmei Liu1, Xiuhua Fu1, Jing Zhang1, Yang Wang2, and Yu Geng2
Author Affiliations
  • 1School of Opto-Electronic Engineering, Changchun University of Science and Technology, Changchun, Jilin 130022, China
  • 2Optorun (Shanghai) Co., Ltd., Shanghai 200444, China
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    References(17)

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    Boyang Wei, Dongmei Liu, Xiuhua Fu, Jing Zhang, Yang Wang, Yu Geng. Study on Film Thickness Uniformity of Magnetron Sputtering System Based on Twin Target[J]. Acta Optica Sinica, 2021, 41(7): 0731001

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    Paper Information

    Category: Thin Films

    Received: Oct. 9, 2020

    Accepted: Nov. 12, 2020

    Published Online: Apr. 11, 2021

    The Author Email: Wei Boyang (sjx8811@sohu.com)

    DOI:10.3788/AOS202141.0731001

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