Acta Optica Sinica, Volume. 41, Issue 7, 0731001(2021)
Study on Film Thickness Uniformity of Magnetron Sputtering System Based on Twin Target
Film thickness uniformity in a magnetron sputtering system is one of the key indicators. The effects of magnetic field intensity, distance between target and substrate and gas pressure on the thickness uniformity of Si3N4 and SiO2 films are analyzed. The plasma density is analyzed by using Langmuir probe, and the longitudinal uniformity is adjusted by binary gradient inflation mode. By loading sine half-wave voltage to the target and using MATLAB software to determine the amplitude and phase parameters, so as to adjust the uniformity of the transverse. The experiment results show that for the Si3N4 film, the transverse uniformity is ±1.27%, ±0.62%, and ±1.33% respectively at the top, middle, and bottom, and the longitudinal uniformity is ±0.33%. For the SiO2 film, the transverse uniformity is ±1.12%, ±0.42%, and ±1.23% respectively at the top, middle, and bottom, and the longitudinal uniformity is ±0.25%.
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Boyang Wei, Dongmei Liu, Xiuhua Fu, Jing Zhang, Yang Wang, Yu Geng. Study on Film Thickness Uniformity of Magnetron Sputtering System Based on Twin Target[J]. Acta Optica Sinica, 2021, 41(7): 0731001
Category: Thin Films
Received: Oct. 9, 2020
Accepted: Nov. 12, 2020
Published Online: Apr. 11, 2021
The Author Email: Wei Boyang (sjx8811@sohu.com)