Acta Physica Sinica, Volume. 69, Issue 17, 174207-1(2020)
Analysis of ArF excimer laser system discharge characteristics in different buffer gases
Qian Wang1,2,3, Jiang-Shan Zhao1,2,3, Yuan-Yuan Fan1,2,3,4, Xin Guo1,2, and Yi Zhou1,2,3、*
Author Affiliations
1Institute of Microelectronics of Chinese Academy of Sciences, Beijing 100094, China2Beijing Excimer Laser Technology and Engineering Center, Beijing 100094, China3University of Chinese Academy of Sciences, Beijing 100049, China4State Key Laboratory of Applied Optics, Changchun 130033, Chinashow less
[1] Vladimir F, Slava R, Robert B, Hong Y, Kevin O, Robert J, Fedor T, Efrain F, Theodore C, Daniel B, William P[J]. Proc. SPIE, 6924, 69241R(2008).
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[8] Shi F[J]. M. S. Dissertation(2008).
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Qian Wang, Jiang-Shan Zhao, Yuan-Yuan Fan, Xin Guo, Yi Zhou. Analysis of ArF excimer laser system discharge characteristics in different buffer gases[J]. Acta Physica Sinica, 2020, 69(17): 174207-1
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