Acta Physica Sinica, Volume. 69, Issue 17, 174207-1(2020)

Analysis of ArF excimer laser system discharge characteristics in different buffer gases

Qian Wang1,2,3, Jiang-Shan Zhao1,2,3, Yuan-Yuan Fan1,2,3,4, Xin Guo1,2, and Yi Zhou1,2,3、*
Author Affiliations
  • 1Institute of Microelectronics of Chinese Academy of Sciences, Beijing 100094, China
  • 2Beijing Excimer Laser Technology and Engineering Center, Beijing 100094, China
  • 3University of Chinese Academy of Sciences, Beijing 100049, China
  • 4State Key Laboratory of Applied Optics, Changchun 130033, China
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    References(19)

    [2] Hirotaka M, Takahito K, Hiroaki T, Akihiko K, Takeshi O, Takashi M, Hakaru M[J]. Proc. SPIE, 7980, 79801I(2016).

    [3] Hirotaka M, Hiroshi F, Keisuke I, Hiroaki T, Akihiko K, Hiroshi T, Takeshi O, Satoru B, Takashi S, Hakaru M[J]. Proc. SPIE, 10587, 1058710(2018).

    [8] Shi F[J]. M. S. Dissertation(2008).

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    Qian Wang, Jiang-Shan Zhao, Yuan-Yuan Fan, Xin Guo, Yi Zhou. Analysis of ArF excimer laser system discharge characteristics in different buffer gases[J]. Acta Physica Sinica, 2020, 69(17): 174207-1

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    Paper Information

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    Received: Jan. 13, 2020

    Accepted: --

    Published Online: Jan. 4, 2021

    The Author Email:

    DOI:10.7498/aps.69.20200087

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