[1] N Harned, C Wagner. Nat. Photonics, 4, 24(2010).

[2] R Schupp, J Sheil, F Torretti et al. Nat. Commun, 11, 2334(2020).

[3] M Bayraktar, F Liu, F Torretti et al. J. Phys. D: Appl. Phys, 53, 055204(2020).

[4] O O Versolato. Plasma. Sources. Sci.Technol, 28, 083001(2019).

[5] Q S Huang, R V D Kruijs, V Medvedev et al. Appl. Phys. Rev, 4, 011104(2017).

[6] U Dinger. 2014 International Workshop on EUV and Soft X-Ray Sources Dublin, Ireland, November 3-6, 94(2014).

[7] D Rudolf, C Schmitz, D Wilson et al. Appl. Phys. Lett, 108, 234101(2016).

[8] F Barkusky, A Bayer, S Döring et al. Proceedings of SPIE, 7361, 736112(2009).

[9] L Juschkin, Y Sidelnikov, I Tobin et al. Appl. Phys. Lett, 102, 203504(2013).

[10] P Dunne, I Kambali, E Scally et al. J. Phys. D: Appl. Phys, 46, 495104(2013).

[11] L Liu, F O’Reilly, G O’Sullivan et al. Opt. Express, 25, 9974(2017).

[12] S George, J H Munsee. J. Opt. Soc. Am. B, 2, 1258(1985).

[13] T Brage, J C Brant, G M Wahlgren et al. Astrophys. J, 551, 520(2001).

[14] S S Churilov, Y N Joshi. Phys. Scripta., 63, 363(2001).

[15] T Higashiguchi, B W Li, T Wu et al. J. Phys. B: At. Mol. Opt. Phys, 49, 035001(2016).

[16] H Hara, H Kawasaki, T Tamura et al. Opt. Lett, 43, 3750(2018).

[17] G Arai, Y Kondo, T Tamura et al. Opt. Lett, 43, 2042(2018).

[19] C O’Gorman, T Otsuka, N Yugami et al. Appl. Phys. Lett, 100, 141108(2012).

[20] S S Harilal, Y Tao, M S Tillack et al. Opt. Lett, 31, 2492(2006).

[21] J R Freemana, S S Harilala, T Sizyuka et al. SPIE Extreme Ultraviolet (EUV) Lithography Ⅲ San Jose, California, February 13-16, 8322(2012).

[22] X L Song, Y Tian, Z Xie et al. AIP. Advances, 6, 035108(2016).

[23] R Lebert, T Mißalla, C Phiesel et al. International Workshop on EUV Lithography Maui, Hawaii, June 17, 31(2015).

[24] S S Harilal, M P Polek, A Roy et al. Phys. Plasmas, 21, 033109(2014).