Chinese Physics B, Volume. 29, Issue 10, (2020)

Interface and border trapping effects in normally-off Al2O3/AlGaN/GaN MOS-HEMTs with different post-etch surface treatments

Si-Qi Jing1...2, Xiao-Hua Ma2, Jie-Jie Zhu1,2,†, Xin-Chuang Zhang1,2, Si-Yu Liu1,2, Qing Zhu1,2 and Yue Hao2 |Show fewer author(s)
Author Affiliations
  • 1School of Advanced Materials and Nanotechnology, Xidian University, Xi’an 7007, China
  • 2Key Laboratory of Wide Bandgap Semiconductor Technology, Xidian University, Xi’an 710071, China
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    Si-Qi Jing, Xiao-Hua Ma, Jie-Jie Zhu, Xin-Chuang Zhang, Si-Yu Liu, Qing Zhu, Yue Hao. Interface and border trapping effects in normally-off Al2O3/AlGaN/GaN MOS-HEMTs with different post-etch surface treatments[J]. Chinese Physics B, 2020, 29(10):

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    Paper Information

    Received: Apr. 24, 2020

    Accepted: --

    Published Online: Apr. 21, 2021

    The Author Email: Zhu Jie-Jie (jjzhu@mail.xidian.edu.cn)

    DOI:10.1088/1674-1056/ab99bb

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