Chinese Physics B, Volume. 29, Issue 10, (2020)
Interface and border trapping effects in normally-off Al2O3/AlGaN/GaN MOS-HEMTs with different post-etch surface treatments
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Si-Qi Jing, Xiao-Hua Ma, Jie-Jie Zhu, Xin-Chuang Zhang, Si-Yu Liu, Qing Zhu, Yue Hao. Interface and border trapping effects in normally-off Al2O3/AlGaN/GaN MOS-HEMTs with different post-etch surface treatments[J]. Chinese Physics B, 2020, 29(10):
Received: Apr. 24, 2020
Accepted: --
Published Online: Apr. 21, 2021
The Author Email: Zhu Jie-Jie (jjzhu@mail.xidian.edu.cn)