[1] W H Bu, Z L Xia, Z G Zhao, et al. Development of lntegrated circuit lndustrial technologies in the post-moore era. Science and Technology Fore-sight, 1, 20-41(2022).

[2] S G Yazgi, T Ivanov, M Holz, et al. Line edge roughness metrology software. Journal of Vacuum Science & Technology B, 38, 012602(2020).

[3] M Neisser. International roadmap for devices and systems lithography roadmap. Journal of Micro/Nanopatterning, Materials, and Metrology, 20, 044601(2021).

[4] [4] Gao S T. Study on measurement atomic fce microscope (AFM)[D]. Tianjin: Tianjin University, 2007. (in Chinese)

[6] [6] Papavieros G, Constantoudis V. Line edge roughness measurement through SEM images: effects of image digitization their mitigation[C]SPIE, 2017, 10446: 104114.

[7] I Misumi, K Kumagai, R Kizu. Pitch calibration of standard nanoscale for uncertainty reduction of certified reference materials for SEM image sharpness evaluation and magnification calibration. Surface Topography: Metrology and Properties, 10, 044010(2022).

[8] X Deng, T B Li, X B Cheng. Self-traceable grating reference material and application. Optics and Precision Engineering, 30, 2608-2625(2022).

[9] L Zhao, G Z Han, X D Zhang, et al. Tracking type line width standard sample based on multilayer film deposition. Acta Metrologica Sinica, 43, 1549-1553(2022).

[10] Ziruo Wu, Yanni Cai, Xingrui Wang, et al. Investigation of AFM tip characterization based on multilayer gratings. Infrared and Laser Engineering, 49, 0213001(2020).

[11] Z D Jiang, C Y Wang, S M Yang. Preparation and typical measurement and characterization of nanostructures. Strategic Study of CAE, 15, 15-20(2013).

[12] G L Dai, L Koenders, J Fluegge, et al. Two approaches for realizing traceability in nanoscale dimensional metrology. Optical Engineering, 55, 091407(2016).

[14] [14] Ttonese M, Prochazka J, Konicek P, et al. 100nmpitch stard acterization f metrology applications[C]Metrology, Inspection, Process Control f Microlithography XVI, SPIE, 2002, 4689: 558564.

[15] J X Zhou, Z Y Chen. Study on three micron-level grids pattern verified reference material used formagnification calibration of SEM. Journal of Chinese Electron Microscopy Society, 185-191(2005).

[17] J J Mcclelland, R E Scholten, E C Palm, et al. Laser-focused atomic deposition. Science, 262, 877-880(1993).

[18] X Deng, T B Li, L H Lei, et al. Fabrication and measurement of traceable pitch standard with a big area at trans-scale. Chinese Physics B, 23, 147-151(2014).

[20] [20] Zhang Qiang. Research on ler effect of line width measurement on nanoscale[D]. Harbin: Harbin Institute of Technology, 2016. (in Chinese)

[21] [21] Li Ning. Research on measurement acterization method of nanoscale semiconduct line roughness[D]. Harbin: Harbin Institute of Technology, 2010. (in Chinese)

[22] L H A Leunissen, W G Lawrence, M Ercken. Line edge roughness: Experimental results related to a two-parameter model. Microelectronic Engineering, 73, 265-270(2004).

[23] X Z Zhao, N Li, F Q Zhou, et al. Influence factors of line edge roughness measured by AFM. Optics and Precision Engineering, 17, 839-848(2009).