Analyses of light field enhancement damage induced by defects in optical thin films

Jinhui Wu; Xiulan Ling; Ji Liu; Xin Chen

doi:10.3788/IRLA20210357

Infrared and Laser Engineering, Volume. 50, Issue 8, 20210357(2021)

Analyses of light field enhancement damage induced by defects in optical thin films

Jinhui Wu1... Xiulan Ling2, Ji Liu1,2 and Xin Chen2 |Show fewer author(s)

¹Ministry of Education and Key Laboratory of Science and Technology on Electronic Test & Measurement, Key Laboratory of Instrumentation Science & Dynamic Measurement,North University of China, Taiyuan 030051, China

²School of Information and Communication Engineering, North University of China, Taiyuan 030051, China

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References(14)

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Jinhui Wu, Xiulan Ling, Ji Liu, Xin Chen. Analyses of light field enhancement damage induced by defects in optical thin films[J]. Infrared and Laser Engineering, 2021, 50(8): 20210357

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