Analyses of light field enhancement damage induced by defects in optical thin films

Jinhui Wu; Xiulan Ling; Ji Liu; Xin Chen

doi:10.3788/IRLA20210357

Infrared and Laser Engineering, Volume. 50, Issue 8, 20210357(2021)

Analyses of light field enhancement damage induced by defects in optical thin films

Jinhui Wu¹, Xiulan Ling², Ji Liu^1,2, and Xin Chen²

¹Ministry of Education and Key Laboratory of Science and Technology on Electronic Test & Measurement, Key Laboratory of Instrumentation Science & Dynamic Measurement,North University of China, Taiyuan 030051, China

²School of Information and Communication Engineering, North University of China, Taiyuan 030051, China

show less

Abstract Get PDF(in Chinese)

Keywords

defect laser-induced damage light field enhancement optical thin film

Tools

Get Citation

Copy Citation Text

Jinhui Wu, Xiulan Ling, Ji Liu, Xin Chen. Analyses of light field enhancement damage induced by defects in optical thin films[J]. Infrared and Laser Engineering, 2021, 50(8): 20210357

Download Citation

EndNote(RIS)BibTex Plain Text

Set citation alerts for article

Save article for my favorites

Paper Information

Category: Photoelectric measurement

Received: Apr. 10, 2021

Accepted: --

Published Online: Nov. 2, 2021

The Author Email:

DOI:10.3788/IRLA20210357

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology