Laser & Optoelectronics Progress, Volume. 48, Issue 11, 111101(2011)

Pupil Shaping Techniques in High Resolution Projection Exposure Tools

Hu Zhonghua1,2、*, Yang Baoxi1, Zhu Jing1, Xiao Yanfeng1,2, Zeng Aijun1, Huang Lihua1, Zhao Yongkai1, and Huang Huijie1
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  • 2[in Chinese]
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    CLP Journals

    [1] Hu Zhonghua, Zhu Jing, Yang Baoxi, Pen Xuefeng, Zeng Aijun, Huang Huijie. Far-Field Multi-Parameter Measurement of Diffractive Optical Element for Pupil Shaping in Lithography System[J]. Chinese Journal of Lasers, 2013, 40(9): 908001

    [2] Yan Guanyong, Li Sikun, Wang Xiangzhao. Source Optimization Method of Lithography Tools Based on Quadratic Programming[J]. Acta Optica Sinica, 2014, 34(10): 1022004

    [3] Hu Zhonghua, Yang Baoxi, Zhu Jing, Xiao Yanfen, Zeng Aijun, Huang Huijie. Design of Diffractive Optical Element for Pupil Shaping Optics in Projection Lithography System[J]. Chinese Journal of Lasers, 2013, 40(6): 616001

    [4] Song Qiang, Zhu Jing, Wang Jian, Zhang Fang, Lü Xiangbo, Yang Baoxi, Huang Huijie. A Mixed Gradient Algorithm for High Performance DOE Design in Off-Axis Lithography Illumination System[J]. Acta Optica Sinica, 2015, 35(1): 122005

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    Hu Zhonghua, Yang Baoxi, Zhu Jing, Xiao Yanfeng, Zeng Aijun, Huang Lihua, Zhao Yongkai, Huang Huijie. Pupil Shaping Techniques in High Resolution Projection Exposure Tools[J]. Laser & Optoelectronics Progress, 2011, 48(11): 111101

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    Paper Information

    Category: Reviews

    Received: Apr. 29, 2011

    Accepted: --

    Published Online: Sep. 30, 2011

    The Author Email: Zhonghua Hu (huzhonghua@siom.ac.cn)

    DOI:10.3788/lop48.111101

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