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Optoelectronics Letters, Volume. 10, Issue 1, 24(2014)

248 nm imaging photolithography assisted by surface plasmon polariton interference

Man-man TIAN1... Jia-jia MI1, Jian-ping SHI1,*, Nan-nan WEI1, Ling-li ZHAN1, Wan-xia HUANG1, Ze-wen ZUO1, Chang-tao WANG2 and Xian-gang LUO2 |Show fewer author(s)
Author Affiliations
  • 1College of Physics and Electronic Information, Anhui Normal University, Wuhu 241000, China
  • 2State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chinese
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    TIAN Man-man, MI Jia-jia, SHI Jian-ping, WEI Nan-nan, ZHAN Ling-li, HUANG Wan-xia, ZUO Ze-wen, WANG Chang-tao, LUO Xian-gang. 248 nm imaging photolithography assisted by surface plasmon polariton interference[J]. Optoelectronics Letters, 2014, 10(1): 24

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    Paper Information

    Received: Sep. 26, 2013

    Accepted: --

    Published Online: Oct. 12, 2017

    The Author Email: Jian-ping SHI (shi_jian_ping@hotmail.com)

    DOI:10.1007/s11801-014-3172-1

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology