Journal of Semiconductors, Volume. 45, Issue 11, 112503(2024)

Demonstration of irradiation-resistant 4H-SiC based photoelectrochemical water splitting

Yan Pei1,3, Wenhao Geng2,3, Lingbo Xu1,3、*, Can Cui1, Xiaodong Pi2,3、**, Deren Yang2,3, and Rong Wang2,3、***
Author Affiliations
  • 1Zhejiang Key Laboratory of Quantum State Control and Optical Field Manipulation, Department of Physics, Zhejiang Sci-Tech University, Hangzhou 310018, China
  • 2State Key Laboratory of Silicon and Advanced Semiconductor Materials & School of Materials Science and Engineering, Zhejiang University, Hangzhou 310027, China
  • 3Institute of Advanced Semiconductors & Zhejiang Provincial Key Laboratory of Power Semiconductor Materials and Devices, Hangzhou Innovation Center, Zhejiang University, Hangzhou 311200, China
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    Figures & Tables(6)
    (Color online) Schematic diagram showing the two-step preparation of 4H-SiC nanoporous arrays. The effect of each etching step is displayed in the figure.
    SEM images of the surface morphologies of (a) original 4H-SiC, (b) S2, (c) S5, (d) S10, (e) S20, and (f) S30. (g) and (h) are cross-sectional SEM images of S10 at low and high magnifications, respectively.
    (Color online) (a) Raman spectra and (b) optical absorption curves of S2, S5, S10, S20, S30, and original 4H-SiC.
    (Color online) (a) LSV and (b) EIS of S2, S5, S10, S20, S30, and original 4H-SiC under simulated sunlight illumination. The inset is the Randles equivalent circuit fitting diagram. (c) Current−time (I−t) curves of the S10 at 1.23 V vs RHE. (d)−(f) Schematic diagram showing the effect of the thickness of the walls of 4H-SiC nanoporous arrays on the carrier transport during PEC water splitting.
    (Color online) (a) The LSV curves of the different-dose electron-irradiated 4H-SiC nanoporous arrays under simulated sunlight illumination at 1.23 V vs RHE. (b) I−t curves of 4H-SiC nanoporous arrays under simulated sunlight illumination before and after different-dose electron irradiation.
    • Table 1. Average diameter of the nanopores and average thickness of the walls of nanopores of the 4H-SiC nanoporous arrays.

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      Table 1. Average diameter of the nanopores and average thickness of the walls of nanopores of the 4H-SiC nanoporous arrays.

      NumberS5S10S20S30
      Wall thickness (nm)27.6627.7422.5918.05
      Pore diameter (nm)25.8832.3131.2333.48
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    Yan Pei, Wenhao Geng, Lingbo Xu, Can Cui, Xiaodong Pi, Deren Yang, Rong Wang. Demonstration of irradiation-resistant 4H-SiC based photoelectrochemical water splitting[J]. Journal of Semiconductors, 2024, 45(11): 112503

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    Paper Information

    Category: Research Articles

    Received: May. 8, 2024

    Accepted: --

    Published Online: Dec. 23, 2024

    The Author Email: Xu Lingbo (LBXu), Pi Xiaodong (XDPi), Wang Rong (RWang)

    DOI:10.1088/1674-4926/24050011

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