Acta Optica Sinica, Volume. 36, Issue 9, 931001(2016)
Influence of Deposition Rate on Microstructure and Optical Properties of Mo Films Fabricated by Direct Current Pulse Sputtering
[1] [1] Ma Guozheng, Xu Binshi, Wang Haidou, et al. Optimal process, microstructure and properties of Mo films deposited by magnetron sputtering[J]. Rare Metal Materials and Engineering, 2014, 43(9): 2221-2226.
[2] [2] Luo Zhenzhong. Application and development of molybdenum[J]. China Molybdenum Industry, 2003, 27(2): 7-10.
[4] [4] Spiller E. Soft X-ray optics[M]. Bellingham: SPIE Optical Engineering Press, 1994.
[5] [5] Wang Xun, Jin Chunshui, Li Chun, et al. Preparation and characteristic of oxide capping-layer on extreme ultraviolet reflective mirrors[J]. Acta Optica Sinica, 2015, 35(3): 0331001.
[6] [6] Vandekruijs R W E, Zoethout E, Yakshin A E, et al. Nano-size crystallites in Mo/Si multilayer optics[J]. Thin Solid Films, 2006, 515(2): 430-433.
[7] [7] Kamikawa Y, Nishinaga J, Ishizuka S, et al. Effects of Mo surface oxidation on Cu (In, Ga) Se2 solar cells fabricated by three-stage process with KF postdeposition treatment[J]. Japanese Journal of Applied Physics, 2016, 55(2): 022304.
[8] [8] Tian Jing, Yang Xin, Liu Shangjun, et al. Effect of thickness on the properties of Cu (Inx, Ga1-x) Se2 back conduct Mo thin films prepared by DC sputtering[J]. Acta Phys Sin, 2013, 62(11): 116801.
[9] [9] Du X K, Wang C, Wang T M, et al. Microstructure and spectral selectivity of Mo-Al2O3 solar selective absorbing coatings after annealing[J]. Thin Solid Films, 2008, 516(12): 3971-3977.
[13] [13] Fan Zhengxiu. Development andrecent progress of optical thin films[J]. Acta Optica Sinica, 2011, 31(9): 0900131.
[14] [14] Zhao J L, Yi K, Wang H, et al. Influence of deposition rate on interface width of Mo/Si multilayers[J]. Thin Solid Film, 2015, 592: 256-261.
[15] [15] Zhu J, Ding Wanyu, Wang H, et al. Effects of argon pressure on properties of Mo films prepared by direct current pulse magnetron[J]. Microfabrication Technology, 2008, 4: 35-38.
[16] [16] Dane A D, Veldhuis A, Boer D K G, et al. Application of genetic algorithms for characterization of thin layered materials by glancing incidence X-ray reflectometry[J]. Physica B: Physics of Condensed Matter, 1998, 253(3-4): 254-268.
[17] [17] Tian Minbo. Thin film technologies and materials[M]. Beijing: Tsinghua University Press, 2006.
[18] [18] Zhang Jianpeng, Huang Meidong, Li Yuan, et al. Effects of RF magnetron sputtering power on structure and properties of the optical vanadium oxide films[J]. Chinese J Lasers, 2015, 42(8): 0807001.
Get Citation
Copy Citation Text
Zhao Jiaoling, He Hongbo, Wang Hu, Guo Jialu, He Ting. Influence of Deposition Rate on Microstructure and Optical Properties of Mo Films Fabricated by Direct Current Pulse Sputtering[J]. Acta Optica Sinica, 2016, 36(9): 931001
Category: Thin Films
Received: Mar. 30, 2016
Accepted: --
Published Online: Sep. 9, 2016
The Author Email: Jiaoling Zhao (jolin923@siom.ac.cn)