Journal of Inorganic Materials, Volume. 39, Issue 1, 17(2024)

Progress of Interconnect Materials in the Third-generation Semiconductor and Their Low-temperature Sintering of Copper Nanoparticles

Xin KE1,2, Bingqing XIE1,2, Zhong WANG1,3、*, Jingguo ZHANG1,3,4, Jianwei WANG1,3, Zhanrong LI1,3,4, Huijun HE1,3, and Limin WANG1,3
Author Affiliations
  • 11. Metal Powder Materials Industrial Technology Research Institute of CHINA GRINM, Beijing 101407, China
  • 22. General Research Institute for Nonferrous Metals, Beijing 100088, China
  • 33. GRIPM Advanced Materials Co. Ltd., Beijing 101407, China
  • 44. Gricy Advanced Materials Co., Ltd., Chongqing 401431, China
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    Xin KE, Bingqing XIE, Zhong WANG, Jingguo ZHANG, Jianwei WANG, Zhanrong LI, Huijun HE, Limin WANG. Progress of Interconnect Materials in the Third-generation Semiconductor and Their Low-temperature Sintering of Copper Nanoparticles[J]. Journal of Inorganic Materials, 2024, 39(1): 17

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    Paper Information

    Category:

    Received: Aug. 1, 2023

    Accepted: --

    Published Online: Mar. 28, 2024

    The Author Email: WANG Zhong (wzwz99@126.com)

    DOI:10.15541/jim20230345

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