Semiconductor Optoelectronics, Volume. 43, Issue 4, 752(2022)

Chromatic Confocal Microscopy Measurement Technique: A Review

WANG Zi1,2, SHI Junkai1、*, CHEN Xiaomei1, JIANG Xingjian1, LI Guannan1, HUO Shuchun1, GAO Chao1,2, ZHU Qiang1,2, and ZHOU Weihu1,2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    Measurement technology is constantly developing in the direction of precision, intelligence and integration, and one of the most representative methods is chromatic confocal microscopy (CCM). CCM is developed on the basis of laser scanning confocal microscope, using the dispersion principle and spectrometer decoding analysis to achieve high-precision measurement. It can perform displacement measurement, 3D reconstruction, surface roughness inspection and thickness inspection, and has the advantages of contactless, high efficiency and online measurement, which are playing an important role in precision measurement and widely used in microelectronics, engineering materials, biomedical and aerospace fields. In recent years, significant developments have been made in various aspects of CCM systems, such as optical system structure, optical lens design, light source optimization and data processing algorithms. This paper reviewed the chromatic confocal microscopy based on extensive research, discussed the advantages of CCM compared with other measurement methods, reviewed the measurement principle, development history and application progress of chromatic confocal microscopy, and outlooked the development trend of CCM.

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    WANG Zi, SHI Junkai, CHEN Xiaomei, JIANG Xingjian, LI Guannan, HUO Shuchun, GAO Chao, ZHU Qiang, ZHOU Weihu. Chromatic Confocal Microscopy Measurement Technique: A Review[J]. Semiconductor Optoelectronics, 2022, 43(4): 752

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    Paper Information

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    Received: Feb. 16, 2022

    Accepted: --

    Published Online: Oct. 16, 2022

    The Author Email: Junkai SHI (shijunkai@ime.ac.cn)

    DOI:10.16818/j.issn1001-5868.2022021601

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