Fig. 1. Schematic diagram of 13.5 nm extreme ultraviolet irradiation damage instrument

Fig. 2. Single-shot EUV damage probability of B₄C films

Fig. 3. AFM damage morphology of B₄C films induced by EUV at energy density of 2.1 J/cm²

Fig. 4. Depth distribution of absorbed energy fraction of B₄C films irradiated by 13.5 nm EUV laser

Fig. 5. 13.5 nm EUV irradiation on S1， S3 and S4 samples

Fig. 6. EUV damage on Au （30 nm）/Si-sub mirror

Fig. 7. Experimental result of EUV damage on Ru（30.8 nm）/D263 and B₄C（6.0 nm）/Ru（30.4 nm）/D263 samples

Fig. 8. Multi-shots EUV damage thresholds of Mo/Si multilayer varied as a function of pulse numbers and the EUV multi-shots damage probability （inserted figure）

Fig. 9. AFM damage morphologies of Mo/Si multilayer irradiated by EUV pulses： （a）-（c） Single-shot damage and （d）-（f） ten-shots damage