Laser Journal, Volume. 45, Issue 3, 224(2024)

Effect of CMP process parameters on the substrate transfer of AlGaInP-based LEDs

WANG Jiawei1, XU Yingchao1,2、*, YANG Kai3, LU Chendong1, FAN Haoshuang1, and LU Yi1
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • 3[in Chinese]
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    References(7)

    [1] [1] Han S C , Xu C C , Li H J , et al. AlGaInP-based Micro - LED array with enhanced optoelectrical properties[J] . Opti- cal Materials , 2021 , 114 : 110860.

    [5] [5] Mu F W , Morino Y , Jerchel K , et al. GaN-Si direct wafer bonding at room temperature for thin GaN device transfer af- ter epitaxial lift off [ J ] . Applied Surface Science , 2017 , 416.

    [6] [6] Fuya N , S I , A P , et al. Void Formation Mechanism Re- lated to Particles During Wafer - to - Wafer Direct Bonding[J] . ECS Journal of Solid State Science and Technology , 2022 , 11(6) :115- 123.

    [7] [7] Kim Y S , Nguyen T H , Sung H C. Enhancement of the Bond Strength and Reduction of Wafer Edge Voids in Hy- brid Bonding[J] . Micromachines , 2022 , 13(4) : 537.

    [9] [9] Zhang Z L , Jin Z J , Guo J. The effect of the interface reac- tion mode on chemical mechanical polishing [ J ] . CIRP Journal of Manufacturing Science and Technology , 2020 , 31 : 539-547.

    [17] [17] Li Z Y , Deng Z H , Hu Y X. Effects of polishing parame- ters on surface quality in sapphire double - sided CMP[J] . Ceramics International , 2020 , 46(9) : 13356- 13364.

    [19] [19] Niu X , Wu T , Zhao X , et al. Study on CMP Mechanism and Technology of Sapphire Substrate for Photo [ J ] . ECS Transactions , 2009 , 18(1) : 435-440.

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    WANG Jiawei, XU Yingchao, YANG Kai, LU Chendong, FAN Haoshuang, LU Yi. Effect of CMP process parameters on the substrate transfer of AlGaInP-based LEDs[J]. Laser Journal, 2024, 45(3): 224

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    Paper Information

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    Received: Jul. 17, 2023

    Accepted: --

    Published Online: Oct. 15, 2024

    The Author Email: Yingchao XU (ycxu@xmut.edu.cn)

    DOI:10.14016/j.cnki.jgzz.2024.03.224

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