[1] [1] CHEN An, LIN Wumei, JIANG Haibo. Impact of non-ideal illumination pupil on imaging performance of lithography [J]. Opto-Electronic Engineering, 2013, 40(2): 87-92.

[2] [2] DENG Yafei, ZHOU Jinyun, LEI Liang, et al. Novel projection lens design for large-area PCB lithography [J]. Opto-Electronic Engineering, 2013, 40(2): 100-104.

[3] [3] SUN Zhen, GONG Yan. Design of V-flexure axial adjusting mechanism of lithograph projection objective [J]. Laser & Optoelectronics Progress, 2013, 50: 101101.

[4] [4] GUO Kang, GONG Yan. Effect of adjusting force on surface figure of optical element in axial adjustment mechanism [J]. Acta Optica Sinica, 2013, 33(11): 1123001.

[5] [5] GUO Kang, GONG Yan. Precise axial adjustment mechanism with 6-PSS type of optical elements [J]. Optics and Precision Engineering, 2013, 21(10): 2648-2653.

[6] [6] RYU J W, GWEON D, MOON K S. Optimal design of a flexure hinge based XYφ wafer stage [J]. Precision Engineering (S0141-6359), 1997, 21(1): 18-28.

[7] [7] PARK S, YANG S. A mathematical approach for analyzing ultra-precision positioning system with compliant mechanism [J]. Journal of Materials Processing Technology(S0924-0136), 2005, 164(5): 1584-1589.

[8] [8] CHEN Guimin, LI Duanling. Degree of freedom of planar compliant mechanisms [J]. Journal of Mechanical Engineering, 2010, 46(13): 48-52.

[9] [9] ZHAO Lei, GONG Yan, ZHAO Yang. Flexure-based X-Y micro-motion mechanism used in lithographic lens [J]. Optics and Precision Engineering, 2013, 21(6): 1426-1432.

[10] [10] NI Mingyang, GONG Yan. Transmission ratio analysis for a lateral adjustment barrel in DUV projection lens [J]. Infrared and Laser Engineering, 2012, 41(12): 3323-3328.

[11] [11] PENG Haifeng, GONG Yan, ZHAO Lei. Performance index analysis of the support of lithographic lens with multi flexural brackets [J]. Opto-Electronic Engineering, 2013, 40(2): 71-75.