Opto-Electronic Engineering, Volume. 42, Issue 6, 50(2015)

Designing for Flexure-based X-Y Adjusting Mechanism of Lithograph Projection Objective

CHEN Huanan*... GUO Kang, ZHANG Linghua, LIU Jian and SHANG Hongbo |Show fewer author(s)
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    The flexure-based X-Y adjusting mechanism is applied in lithograph projection objectives to compensate the eccentric position of the optical elements in X-Y direction. Based on flexible hinges, two-stage flexible deceleration mechanism is designed. Further, making use of the two-stage flexible deceleration mechanism, a flexure-based X-Y adjusting mechanism which is new and of one part is created. Based on the analysis of the principle of the mechanism, structural parameters of the flexure-based X-Y adjusting mechanism are optimized. Moreover, using finite element method, performance of the flexure-based X-Y adjusting mechanism is studied. The results showed that the adjusting stroke is greater than ±20 μm, the displacement input-output relationship of the mechanism is steady, the transmission ratio is 11.9, the theoretically regulation accuracy is about 8.4 nm, the single-direction drive stiffness is 0.473 μm/N, and the ratio of coupling error and the main movement is 7.1%, when the mechanism moves open-loop and single-axis, and the first modal frequency is greater than 200 Hz. The flexure-based X-Y adjusting mechanism can be used in lithograph projection objective.

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    CHEN Huanan, GUO Kang, ZHANG Linghua, LIU Jian, SHANG Hongbo. Designing for Flexure-based X-Y Adjusting Mechanism of Lithograph Projection Objective[J]. Opto-Electronic Engineering, 2015, 42(6): 50

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    Paper Information

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    Received: Jun. 16, 2014

    Accepted: --

    Published Online: Jul. 10, 2015

    The Author Email: Huanan CHEN (chennyhit@163.com)

    DOI:10.3969/j.issn.1003-501x.2015.06.009

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