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Semiconductor Optoelectronics, Volume. 44, Issue 4, 600(2024)

Absorption Characteristics of Particles on the Surface of A Highly Reflective Mirror under Continuous-Wave Laser Irradiation

JIANG Wenchang1...2,3,4, SHI Jianliang1,2,3, YANG Xinxin1,2,3, and REN Ge1,23 |Show fewer author(s)
Author Affiliations
  • 1National Key Laboratory of Optical Field Manipulation Science and Technology, Chinese Academy of Sciences, Chengdu 610209, CHN
  • 2Key Laboratory of Optical Engineering, Chinese Academy of Sciences, Chengdu 610209, CHN
  • 3Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, CHN
  • 4University of Chinese Academy of Sciences, Beijing 100049, CHN
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    JIANG Wenchang, SHI Jianliang, YANG Xinxin, REN Ge. Absorption Characteristics of Particles on the Surface of A Highly Reflective Mirror under Continuous-Wave Laser Irradiation[J]. Semiconductor Optoelectronics, 2024, 44(4): 600

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    Paper Information

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    Received: Feb. 21, 2024

    Accepted: Feb. 13, 2025

    Published Online: Feb. 13, 2025

    The Author Email:

    DOI:10.16818/j.issn1001-5868.2024022102

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology