Journal of Semiconductors, Volume. 44, Issue 5, 052101(2023)
Homojunction structure amorphous oxide thin film transistors with ultra-high mobility
Fig. 1. (Color online) HRTEM cross-sectional images of the homojunction layer on a SiO2/Si substrate. (a) Schematic diagram of the TFT device with homojunction amorphous ZnAlSnO active layer. (b) Scale bar, 10 nm, inset: SAED pattern; (c) scale bar, 2 nm. (d, e) Energy dispersive X-ray (EDX) line profile of the homojunction layer.
Fig. 2. (Color online) XPS spectra of O 1s. (a) ZTO film annealed at 900 °C. (b) ZATO film annealed at 500 °C. (c) ZATO film unannealed. (d) Areal ratios of the three O sub-peaks (OⅠ, OⅡ and OⅢ).
Fig. 3. (Color online) Electrical characteristics of TFTs with different active layers. (a) Output characteristics, (b) transfer curve atVDS = 20 V and (c) the corresponding curve ofIDS1/2 versusVGS of the TFT device constituted by the homojunction layer. (d–f) TFT with uniform ZATO active layer.
Fig. 4. (Color online) Conduction mechanism through the homojunction layer. (a) Schematic diagram of the carrier conducting path of a traditional TFT with uniform active layer during saturation mode. (b) Carrier transport model of homojunction structured amorphous oxide TFT.
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Rongkai Lu, Siqin Li, Jianguo Lu, Bojing Lu, Ruqi Yang, Yangdan Lu, Wenyi Shao, Yi Zhao, Liping Zhu, Fei Zhuge, Zhizhen Ye. Homojunction structure amorphous oxide thin film transistors with ultra-high mobility[J]. Journal of Semiconductors, 2023, 44(5): 052101
Category: Articles
Received: Sep. 29, 2022
Accepted: --
Published Online: Jun. 15, 2023
The Author Email: Lu Jianguo (lujianguo@zju.edu.cn), Zhao Yi (yizhao@zju.edu.cn), Ye Zhizhen (yezz@zju.edu.cn)