Journal of Semiconductors, Volume. 44, Issue 11, 114104(2023)

Incomplete charge transfer in CMOS image sensor caused by Si/SiO2 interface states in the TG channel

Xi Lu1, Changju Liu2,3, Pinyuan Zhao1, Yu Zhang1、*, Bei Li3, Zhenzhen Zhang1, and Jiangtao Xu2、**
Author Affiliations
  • 1School of Electronics and Information, Hangzhou Dianzi University, Hangzhou 310018, China
  • 2Tianjin Key Laboratory of Imaging and Sensing Microelectronic Technology, School of Microelectronics, Tianjin University, Tianjin 300072, China
  • 3Chongqing Optoelectronics Research Institute, Chongqing 400060, China
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    References(25)

    [8] E R Fossum. Charge transfer noise and lag in CMOS active pixel sensors. IEEE Workshop CCD’s Adv. Image Sensors, 11(2003).

    [17] Y Xu. Fundamental characteristics of a pinned photodiode CMOS pixel. Ph. D. dissertation, Dept. Microelectron. Comput. Eng., Delft Univ. Technol., Delft, the Netherlands(2015).

    [18] B Fowler, X Liu. Charge transfer noise in image sensors. International Image Sensor Workshop (IISW), 2(2007).

    [21] E Liu, B Zhu, J Luo. The physics of semiconductors. Beijing: House of Electronics Industry, 1, 1(2011).

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    Xi Lu, Changju Liu, Pinyuan Zhao, Yu Zhang, Bei Li, Zhenzhen Zhang, Jiangtao Xu. Incomplete charge transfer in CMOS image sensor caused by Si/SiO2 interface states in the TG channel[J]. Journal of Semiconductors, 2023, 44(11): 114104

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    Paper Information

    Category: Articles

    Received: Aug. 16, 2023

    Accepted: --

    Published Online: Jan. 3, 2024

    The Author Email: Zhang Yu (YZhang), Xu Jiangtao (JTXu)

    DOI:10.1088/1674-4926/44/11/114104

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