Spectroscopy and Spectral Analysis, Volume. 32, Issue 7, 1729(2012)
Characteristics of Extreme Ultraviolet Emission from Tin Plasma Using CO2 Laser for Lithography
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WU Tao, WANG Xin-bing, WANG Shao-yi, LU Pei-xiang. Characteristics of Extreme Ultraviolet Emission from Tin Plasma Using CO2 Laser for Lithography[J]. Spectroscopy and Spectral Analysis, 2012, 32(7): 1729
Received: Nov. 13, 2011
Accepted: --
Published Online: Sep. 26, 2012
The Author Email: Tao WU (wtlaser@126.com)