Journals Articles Conferences News About CLP
Submit a paper Email Alert
Search
Search
Articles
Journals
News
Advanced Search
Top Searches
2D MaterialsTransformation opticsQuantum PhotonicsSmall lasersSemiconductor UV PhotonicsSupersymmetric microring laser arrays

Spectroscopy and Spectral Analysis, Volume. 32, Issue 7, 1729(2012)

Characteristics of Extreme Ultraviolet Emission from Tin Plasma Using CO2 Laser for Lithography

WU Tao1...2,*, WANG Xin-bing1, WANG Shao-yi1, and LU Pei-xiang12 |Show fewer author(s)
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
    • show less
    AbstractGet PDF
    Figures&Tables (0)
    Equations (0)
    References (22)
    Tools
    Paper Information
    Topics
    Figures & Tables(0)
    Tools

    Get Citation

    Copy Citation Text

    WU Tao, WANG Xin-bing, WANG Shao-yi, LU Pei-xiang. Characteristics of Extreme Ultraviolet Emission from Tin Plasma Using CO2 Laser for Lithography[J]. Spectroscopy and Spectral Analysis, 2012, 32(7): 1729

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Set citation alerts for article
    Save article for my favorites
    Paper Information

    Received: Nov. 13, 2011

    Accepted: --

    Published Online: Sep. 26, 2012

    The Author Email: Tao WU (wtlaser@126.com)

    DOI:10.3964/j.issn.1000-0593(2012)07-1729-05

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology