Optics and Precision Engineering, Volume. 18, Issue 5, 1166(2010)
Design and thermal analysis of high performance MEMS capacitive pressure sensor
[4] [4] WANG Q, KO W H.Modeling of touch mode capacitive sensors and diaphragms [J].Sensors and Actuators A, 1999,75:230-241.
[5] [5] LV H J, GUO Q, HU G Q.A touch mode capacitive pressure sensor with long linear range and high sensitivity [C].3rd IEEE International Conference of Nano/Micro Engineered and Molecular Systems, Sanya, China,2008:796-800.
[6] [6] GUO Q, LV H J, HU G Q.New kind of touch mode capacitive pressure sensor [J].Instrument Technique and Sensor,2008(3):1-3.(in Chinese)
[7] [7] PARKUS H.Thermoelasticity [M].2nd ed.New York: Springer Press, 1976.
[8] [8] CAI Y E.Finite Element Method and Program Design of Thermo-Elasticity [M].Beijing: Peking University Press, 1997.(in Chinese)
[9] [9] LIU W J, ASHEGHI M.Thermal conduction in ultrathin pure and doped single-crystal silicon layers at high temperatures [J].Journal of Applied Physics, 2005,98(123523):1-6.
[10] [10] BERMAN R.Thermal Conduction in Solids [M].London: Oxford University Press, 1976.
[11] [11] HOLLAND M G.Analysis of lattice thermal conductivity [J].Physical Review, 1963,132(6):2461-2471.
[12] [12] ASHEGHI M, TOUZELBAEV M N, GOODSON K E, et al..Temperature-dependent thermal conductivity of single-crystal silicon layers in SOI substrates [J].Journal of Heat Transfer, 1998,120:30-36.
[13] [13] ASHEGHI M, KURABAYASHI K, KASNAVI R, et al..Thermal conduction in doped single-crystal silicon films [J].Journal of Applied Physics, 2002,91(8):5079-5088.
[14] [14] WOLF H F.Silicon Semiconductor Data [M].Oxford: Pergamon Press, 1969.
[15] [15] LEE S M, DAVID G C, THOMAS H A.Thermal conductivity of sputtered oxide films [J].Physical Review B,1995,52(1):253-257.
[16] [16] DAVID G C, KATIYAR M, ABELSON J R.Thermal conductivity of α-Si: H thin films [J].Physical Review B, 1994,50(9):6077-6082.
[17] [17] MA Q F, FANG R SH, XIANG L CH, et al..Practical Handbook of Thermophysical Properties[M].Beijing: Chinese Agricultural Machinery Press, 1986.(in Chinese)
[18] [18] GB/T 4339-1999, Testing method for thermal expansion characteristic parameters of metallic materials [S].Beijing: Standards Press of China, 2000.(in Chinese)
[19] [19] KAHN H, HUFF M A, HEUER A H.Heating effects on the young’s modulus of films sputtered onto micromachined resonators[C].Materials Research Society Symposium Proceedings, San Francisco, U.S.A,1998:33-38.
[20] [20] WEIHS T P, HONG S, BRAVMAN J C, et al..Mechanical deflection of cantilever microbeams: a new technique for testing the mechanical properties of thin films [J].Materials Research Society, 1988,3:931-942.
[21] [21] HARUNA T, AMY E K, RICHARD E L, et al..Thermal expansion coefficient of polycrystalline silicon and silicon dioxide thin films at high temperatures [J].Journal of Applied Physics, 2000,87(9):4189-4293.
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LV Hao-jie, HU Guo-qing, ZOU Wei, WU Can-yun, CHEN Yu-feng. Design and thermal analysis of high performance MEMS capacitive pressure sensor[J]. Optics and Precision Engineering, 2010, 18(5): 1166
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Received: Sep. 30, 2009
Accepted: --
Published Online: Aug. 31, 2010
The Author Email: Hao-jie LV (hoiselv@yahoo.com.cn)
CSTR:32186.14.