[1] [1] Manske E, Jager G, Hausotte T, et al. Recent developments and challenges of nanopositioning and nanomeasuring technology[J]. Measurement Science & Technology, 2012, 23(7): 074001.

[2] [2] Damian V S, Bojan M, Schiopu P, et al. White light interferometry applications in nanometrology[C]//Proceedings of SPIE - The International Society for Optical Engineering, 2009, 7297: 72971H.

[3] [3] Laude B, Martino A D, Drevillon B. Three-dimensional microscopy through white light interferometry[C]// Proceedings of SPIE, 2002, 4621:1-7.

[4] [4] Zhang J W, Belouadah R, Lebrun L, et al. Magnetoelectric phenomena of insulator polymers after corona poling: procedure and experiments[J]. Sensors & Actuators A Physical, 2014, 220: 112-117.

[5] [5] Gurov I, Volynsky M. White-light microscopy for evaluating transparent films using switching model of overlapped fringes[C]//American Institute of Physics, 2010:295-300.

[6] [6] Dai G, Pohlenz F, Xu M, et al. Accurate and traceable measurement of nano- and microstructures[J]. Measurement Science & Technology, 2006, 17(3): 545-552.

[7] [7] Chen S, Palmer A W, Grattan K T, et al. Digital signal-processing techniques for electronically scanned optical-fiber white-light interferometry[J]. Appl Opt, 1992, 31(28): 6003-6010.

[8] [8] Kino G S, Chim S S C. Mirau correlation microscope[J]. Applied Optics, 1990, 29(26): 3775-3783.

[9] [9] Hart M, Vass D G, Begbie M L. Fast surface profiling by spectral analysis of white-light interferograms with fourier transform spectroscopy[J]. Applied Optics, 1998, 37(10):1764-1769.

[10] [10] Jiang Y. Fourier transform white-light interferometry for the measurement of fiber-optic extrinsic fabry-pérot interferometric sensors[J]. IEEE Photonics Technology Letters, 2008, 20(2): 75-77.

[11] [11] Lei L, Deng L, Fan G, et al. A 3D micro tactile sensor for dimensional metrology of micro structure with nanometer precision[J]. Measurement, 2014, 48(1): 155-161.

[12] [12] Sun Y, Duthaler S, Nelson B J. Autofocusing in computer microscopy: selecting the optimal focus algorithm[J]. Microscopy Research & Technique, 2004, 65(3): 139-149.

[13] [13] Harasaki A, Schmit J, Wyant J C. Improved vertical-scanning interferometry[J]. Applied Optics, 2000, 39(13): 2107.

[14] [14] O′Mahony C, Hill M, Brunet M, et al. Characterization of micromechanical structures using white-light interferometry[J]. Measurement Science & Technology, 2003, 14(10): 1807-1814.

[15] [15] Kramar J A. Nanometre resolution metrology with the molecular measuring machine[J]. Measurement Science & Technology, 2005, 16(11): 2121.

[16] [16] Schmidt, Hausotte, Gerhardt, et al. Investigations and calculations into decreasing the uncertainty of a nanopositioning and nanomeasuring machine (NPM-machine) [J]. Measurement Science & Technology, 2007, 18(2): 2026.

[17] [17] Kapusi D, Machleidt T. White light interferometry in combination with a nanopositioning and nanomeasuring machine (NPMM)[C]//Proceedings of SPIE - The International Society for Optical Engineering, 2007, 6616:661607.

[18] [18] Hoffmann J, Weckenmann A. Traceable profilometry with a 3D nanopositioning unit and zero indicating sensors in compensation method[C]// Journal of Physics: Conference Series, 2005, 13:228.

[19] [19] Subbarao M, Tyan J K. Selecting the optimal focus measure for autofocusing and depth-from-focus[J]. Pattern Analysis & Machine Intelligence IEEE Transactions on, 1998, 20(8):864-870.

[20] [20] Misumi I, Gonda S, Kurosawa T, et al. Reliability of parameters of associated base straight line in step height samples: Uncertainty evaluation in step height measurements using nanometrological AFM[J]. Precision Engineering, 2006, 30(1): 13-22.

[21] [21] Lei L, Li Y, Deng X, et al. Laser-focused Cr atomic deposition pitch standard as a reference standard[J]. Sensors & Actuators A Physical, 2015, 222: 184-193.

[22] [22] Tibrewala A, Hofmann N, Phataralaoha A, et al. Development of 3D force sensors for nanopositioning and nanomeasuring machine[J]. Sensors, 2009, 9(5): 3228-3239.