Infrared and Laser Engineering, Volume. 53, Issue 12, 20240333(2024)

Study on the factors affecting the spatial resolution of EBCMOS with uniformly doped substrate

Jiatong ZHENG1, De SONG1, Feng SHI2, Bei JIANG1, Tong ZHANG1, and Weijun CHEN1
Author Affiliations
  • 1School of Physics, Changchun University of Science and Technology, Changchun 130022, China
  • 2Science and Technology on Low-Light-Level Night Vision Laboratory, Xi’an 710065, China
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    References(16)

    [3] W WANG, Y LI, W J CHEN et al. Simulation of the electrostatic distribution in the proximity focusing structure of an EBCMOS. IEEE Photonics Journal, 12, 6901210(2020).

    [5] Jiafeng TIAN, De SONG, Weijun CHEN. Effect of doping distribution on the surface layer of electron multiplier on charge collection efficiency of EBCMOS. Semiconductor Optoelectronics, 42, 45-51, 105(2021).

    [6] [6] XU Zihao. Simulation on electron transpt process of EBCMOS [D]. Changchun: Changchun University of Science Technology, 2022. (in Chinese)

    [7] De SONG, Feng SHI, Ye LI. Simulation of charge collection efficiency for EBAPS with uniformly doped substrate. Infrared and Laser Engineering, 45, 0203002(2016).

    [9] X N WANG, D SONG, G CH JIAO et al. Characterising backscattered electrons in EBCMOS. IEEE Photonics Journal, 14, 1-5(2022).

    [11] [11] TIZ S, OTADUY D, DRONSO C. Optimum parameters in image intensifier MTF measurements[C]SPIE, 2004, 5612: 382391.

    [12] Jinyuan NI, Luzi WANG, Hao WANG et al. Research on measurement technology of the MTF of low-light level image intensifiers. Infrared Technology, 41, 1161-1166(2019).

    [14] [14] PIAO X, SHI F, SONG J, et al. Simulation of multiplying electron distribution in electron multiplier layer f EBAPS[C]SPIE, 2016, 10141: 207211.

    [15] [15] PIAO Xue. Theetical simulation of ge collection efficiency of active pixel sens by electron bombardment [D]. Changchun: Changchun University of Science Technology, 2017. (in Chinese)

    [16] [16] WU Meijuan, REN Ling, CHANG Benkang, et al. Simulation of image intensifier resolution in Monte Carlo method[J]. Journal of Vacuum Science Technology , 2012, 32(9): 798801 . (in Chinese)

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    Jiatong ZHENG, De SONG, Feng SHI, Bei JIANG, Tong ZHANG, Weijun CHEN. Study on the factors affecting the spatial resolution of EBCMOS with uniformly doped substrate[J]. Infrared and Laser Engineering, 2024, 53(12): 20240333

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    Paper Information

    Category: 光学器件

    Received: Sep. 1, 2024

    Accepted: --

    Published Online: Jan. 16, 2025

    The Author Email:

    DOI:10.3788/IRLA20240333

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