Infrared and Laser Engineering, Volume. 53, Issue 12, 20240333(2024)
Study on the factors affecting the spatial resolution of EBCMOS with uniformly doped substrate
Fig. 1. (a) Structure of EBCMOS electron multiplier layer; (b) The trajectory diagram of electron movement in the blue dotted line box in (a)
Fig. 2. (a) Multiplier electron drop point diagram; (b) Statistical chart of landing point
Fig. 3. PSF images at different base thicknesses (The inner panel shows the top view of PSF)
Fig. 4. LSF curve (a) and MTF curve (b) under different base thickness
Fig. 5. PSF images at different substrate doping concentrations (The inner panel shows the top view of PSF)
Fig. 6. LSF curve (a) and MTF curve (b) under different substrate doping concentration
Fig. 7. PSF images at different incident electron energies (The inner panel shows the top view of PSF)
Fig. 8. LSF curve (a) and MTF curve (b) under different incident electron energies
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Jiatong ZHENG, De SONG, Feng SHI, Bei JIANG, Tong ZHANG, Weijun CHEN. Study on the factors affecting the spatial resolution of EBCMOS with uniformly doped substrate[J]. Infrared and Laser Engineering, 2024, 53(12): 20240333
Category: 光学器件
Received: Sep. 1, 2024
Accepted: --
Published Online: Jan. 16, 2025
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