High-resolution X-ray flash radiography of Ti characteristic lines with multilayer Kirkpatrick–Baez microscope at the Shenguang-II Update laser facility

Shengzhen Yi; Feng Zhang; Qiushi Huang; Lai Wei; Yuqiu Gu; Zhanshan Wang

doi:10.1017/hpl.2021.30

High Power Laser Science and Engineering, Volume. 9, Issue 3, 03000e42(2021)

High-resolution X-ray flash radiography of Ti characteristic lines with multilayer Kirkpatrick–Baez microscope at the Shenguang-II Update laser facility

Shengzhen Yi^1,2, Feng Zhang³, Qiushi Huang^1,2, Lai Wei³, Yuqiu Gu³, and Zhanshan Wang^1,2、*

Author Affiliations

¹MOE Key Laboratory of Advanced Micro-Structured Materials, Tongji University, Shanghai200092, China

²School of Physics Science and Engineering, Tongji University, Shanghai200092, China

³Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang621900, China

show less

Cited By

Article index updated:Apr. 3, 2024

Citation counts are provided from Web of Science. The counts may vary by service, and are reliant on the availability of their data.

The article is cited by 13 article(s) from Web of Science.

Tools

Get Citation

Copy Citation Text

Shengzhen Yi, Feng Zhang, Qiushi Huang, Lai Wei, Yuqiu Gu, Zhanshan Wang. High-resolution X-ray flash radiography of Ti characteristic lines with multilayer Kirkpatrick–Baez microscope at the Shenguang-II Update laser facility[J]. High Power Laser Science and Engineering, 2021, 9(3): 03000e42

Download Citation

EndNote(RIS)BibTex Plain Text

Set citation alerts for article

Save article for my favorites

Paper Information

Category: Research Articles

Received: Mar. 8, 2021

Accepted: May. 17, 2021

Published Online: Jul. 27, 2021

The Author Email: Zhanshan Wang (wangzs@tongji.edu.cn)

DOI:10.1017/hpl.2021.30

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology