High Power Laser and Particle Beams, Volume. 37, Issue 2, 021004(2025)

Protective layer of oxides and nitrides on the surface of extreme ultraviolet multilayers

Jiaxing Wang... Weiming Han, Han Zhang and Shangqi Kuang* |Show fewer author(s)
Author Affiliations
  • Department of Physics, Changchun University of Science and Technology, Changchun 130022, China
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    References(21)

    [2] Li Chaoyi, Tao Baoquan, Guo Xiangshuai. Research progress on extreme ultraviolet multilayer techniques[J]. Journal of Quantum Optics, 26, 397-408(2020).

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    [7] Mizutani U, Yamaguchi T, Ikuta H et al. Fabrication of Mo/Si multilayer mirrors for extreme ultraviolet lithography by means of superconducting bulk magnet magnetron sputtering[J]. Physica C: Superconductivity, 468, 1456-1460(2008).

    [8] Zheng Yi, Sanche L. Effective and absolute cross sections for low-energy (1-30 eV) electron interactions with condensed biomolecules[J]. Applied Physics Reviews, 5, 021302(2018).

    [9] Pelizzo M G, Suman M, Monaco G et al. High performance EUV multilayer structures insensitive to capping layer optical parameters[J]. Optics Express, 16, 15228-15237(2008).

    [10] [10] Seo H S, Park J, Lee S Y, et al. Properties of EUVL masks as a function of capping layer absber stack structures[C]Proceedings of the SPIE 6517, Emerging Lithographic Technologies XI. 2007: 65171G.

    [12] [12] Nesládek P, Scht J, Krome T. EUV capping layer integrity[C]Proceedings of the SPIE 10807, Photomask Japan 2018: XXV Symposium on Photomask NextGeneration Lithography Mask Technology. 2018: 108070E.

    [14] Xu Da, Zhu Jingtao, Zhang Zhong. Design of capping layers on Mo/Si multilayer[J]. Acta Photonica Sinica, 38, 160-164(2009).

    [15] Kim T G, Lee S Y, Kim C Y et al. Characterization of Ru layer for capping/buffer application in EUVL mask[J]. Microelectronic Engineering, 83, 688-691(2006).

    [16] [16] Wang Xun. Study on surface anticontamination capping layer of the EUV optical elements related technologies[D]. Changchun: Graduate School of Chinese Academy of Sciences (Changchun Institute of Optics, Fine Mechanics Physics), 2015

    [17] Nishiyama I, Oizumi H, Motai K et al. Reduction of oxide layer on Ru surface by atomic-hydrogen treatment[J]. Journal of Vacuum Science & Technology B, 23, 3129-3131(2005).

    [20] Zhu Wenxiu, Jin Chunshui, Kuang Shangqi. Design and fabrication of the multilayer film of enhancing spectral-purity in extreme ultraviolet[J]. Acta Optica Sinica, 32, 1031002(2012).

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    Jiaxing Wang, Weiming Han, Han Zhang, Shangqi Kuang. Protective layer of oxides and nitrides on the surface of extreme ultraviolet multilayers[J]. High Power Laser and Particle Beams, 2025, 37(2): 021004

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    Paper Information

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    Received: Jun. 28, 2024

    Accepted: Nov. 18, 2024

    Published Online: Mar. 25, 2025

    The Author Email: Kuang Shangqi (ksq@cust.edu.cn)

    DOI:10.11884/HPLPB202537.240216

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