Acta Physica Sinica, Volume. 69, Issue 17, 177102-1(2020)

Shot noise model of the short channel metal-oxide-semiconductor field-effect transistor

Meng Zhang... Ruo-He Yao*, Yu-Rong Liu and Kui-Wei Geng |Show fewer author(s)
Author Affiliations
  • School of Electronic and Information Engineering, South China University of Technology, Guangzhou 510641, China
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    Figures & Tables(8)
    Structure diagram of the NMOSFET device.
    Schematic diagram of the transistor with a fictitious dc source in the channel.
    Full-shot noise and thermal noise vs. gate-source bias voltage (Leff = 40 nm).
    Fano factor of shot noise vs. gate-source bias voltage (Leff = 40 nm).
    Full-shot noise and thermal noise vs. gate-source bias voltage (Leff = 20 nm).
    Fano factor of shot noise vs. gate-source bias voltage (Leff = 20 nm).
    Full-shot noise and thermal noise vs. gate-source bias voltage (Leff = 10 nm).
    Fano factor of shot noise vs. gate-source bias voltage (Leff = 10 nm).
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    Meng Zhang, Ruo-He Yao, Yu-Rong Liu, Kui-Wei Geng. Shot noise model of the short channel metal-oxide-semiconductor field-effect transistor[J]. Acta Physica Sinica, 2020, 69(17): 177102-1

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    Paper Information

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    Received: Apr. 5, 2020

    Accepted: --

    Published Online: Jan. 4, 2021

    The Author Email:

    DOI:10.7498/aps.69.20200497

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