[1] [1] WEN ZH Y, WEN ZH Q, XU SH L, et al. Vacuum microelectronic pressure sensor[J]. Opt. Precision Eng., 2004, 12(6): 603-607. (in Chinese)

[2] [2] LIANG J Q, HOU F J. One-dimension optical fiber array with silicon V-grooves [J]. Opt. Precision Eng., 2007, 15(1): 89-94. (in Chinese)

[3] [3] JING C, LI T L, ZHI J L, et al.. Study of anisotropic etching of (1 0 0) Si with ultrasonic agitation [J]. Sensors and Actuators A, 2002, 96: 152-156.

[4] [4] CHII R Y, PO Y C, YUANG C C, et al.. Effects of mechanical agitation and surfactant additive on silicon anisotropic etching in alkaline KOH solution [J]. Sensors and Actuators A, 2005, 119: 263-270.

[5] [5] THEO B, DAVID J S. AFM study of surface finish improvement by ultrasound in the anisotropic etching of Si in KOH for micromachining applications[J]. Micromech. Microeng., 1997, 7: 338-342.

[6] [6] LIU Y L, TAN B M, ZHANG K L. Micro-electronic Technology Engineering——Material, Process and Testing[M]. Bejing: Publishing House of Electronics Industry, 2004.(in Chinese)

[7] [7] WANG F SH, TAN J B. Methods of high resolution optical measurement for surface profile [J]. Opt. Precision Eng., 2000, 8(4): 309-315. (in Chinese)

[8] [8] CAO F G. Ultrasonic Machining Technology[M]. Bejing: Chemical industry Press, 2005.(in Chinese)