Laser & Optoelectronics Progress, Volume. 54, Issue 9, 91407(2017)

Study on 532-nm Flattened Laser Beam for Silicon Wafer Grooving

Li Haiou1、*, Wei Chunrong1, Wang Xiaofeng2,3, Zhang Zichen2,4, and Pan Lingfeng2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • 3[in Chinese]
  • 4[in Chinese]
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    According to the diffraction principle, a flattened shaping element is designed and prepared, which converts a Gaussian distribution of laser energy to a flat-top distribution. The laser dicing test of silicon wafers is carried out by using the 532 nm pulsed laser and the influences of laser energy, dicing speed and focusing position on the wafer cutting effect are investigated. The results show that based on the laser dicing by flattened beams, a groove with a width of about 16 μm and a depth of about 18 μm can be obtained, whose bottom is flat and wall is steep. In addition, the heat affected zone under the flattened beam is obviously smaller than that under the Gaussian beam.

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    Li Haiou, Wei Chunrong, Wang Xiaofeng, Zhang Zichen, Pan Lingfeng. Study on 532-nm Flattened Laser Beam for Silicon Wafer Grooving[J]. Laser & Optoelectronics Progress, 2017, 54(9): 91407

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    Paper Information

    Category: Lasers and Laser Optics

    Received: Mar. 23, 2017

    Accepted: --

    Published Online: Sep. 6, 2017

    The Author Email: Haiou Li (seagull_1228@hotmail.com)

    DOI:10.3788/lop54.091407

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