Optical Instruments, Volume. 41, Issue 3, 81(2019)
Properties and preparation of low stress SiNx film by PECVD
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LI Pan, ZHANG Qian, XIA Jinsong, LU Hong. Properties and preparation of low stress SiNx film by PECVD[J]. Optical Instruments, 2019, 41(3): 81
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Received: Jul. 16, 2018
Accepted: --
Published Online: Sep. 2, 2019
The Author Email: Pan LI (leepan@hust.edu.cn)
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