Acta Optica Sinica, Volume. 17, Issue 12, 1756(1997)
Two-Mirror Aspheric Optical System for Soft X-Ray Lithography with Nonscanning Mode
A two mirror aspheric optical system has been designed for soft X ray reduction lithography. The designed optics achieves a defraction MTF value of over 0.5 at 13 nm wavelength and at a spatial frequency of 5300 lines/mm capable of resolving <0.1 μm lines and spaces within a flat field of φ30 mm. The reduction ratio is 1/6, working F/# is 2.554 and the maximum distortion is 0.04%.
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[in Chinese], [in Chinese]. Two-Mirror Aspheric Optical System for Soft X-Ray Lithography with Nonscanning Mode[J]. Acta Optica Sinica, 1997, 17(12): 1756