Acta Photonica Sinica, Volume. 47, Issue 3, 324001(2018)

Surface Planarization Process of RB-SiC Based on Magnetron Sputtering and ICP Etching

ZHAO Yang-yong*, LIU Wei-guo, and XI Ying-xue
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    References(17)

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    ZHAO Yang-yong, LIU Wei-guo, XI Ying-xue. Surface Planarization Process of RB-SiC Based on Magnetron Sputtering and ICP Etching[J]. Acta Photonica Sinica, 2018, 47(3): 324001

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    Paper Information

    Received: Oct. 30, 2017

    Accepted: --

    Published Online: Feb. 1, 2018

    The Author Email: Yang-yong ZHAO (zhaoyy_0011@163.com)

    DOI:10.3788/gzxb20184703.0324001

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