[1] [1] AHN M, HEILMANN R K, SCHATTENBURG M L. Fabrication of ultrahigh aspect ratio freestanding gratings on silicon-on-insulator wafers ［J］. Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, 2007, 25(6): 2593-2597.

[2] [2] FUJII Y, AOYAMA K, MINOWA J. Optical demultiplexer using a silicon echelette grating ［J］. IEEE Journal of Quantum Electronics, 1980, 16(2): 165-169.

[3] [3] TSANG W T, WANG S. Preferentially etched diffraction gratings in silicon ［J］. Journal of Applied Physics, 1975, 46(5): 2163-2166.

[4] [4] QIU K Q, ZHOU X W, LIU Y, et al.. Ion beam etching of large aperture diffractive optical elements ［J］. Opt. Precision Eng., 2012, 20(8): 1676-1683. (in Chinese)

[5] [5] TAN X, LI W H, BAYANHESHIG, et al.. Fabrication of ultraviolet holographic blazed grating ［J］. Opt. Precision Eng., 2010, 18(7): 1536-1542. (in Chinese)

[6] [6] DAVID C, BRUDER J, ROHBECK T, et al.. Fabrication of diffraction gratings for hard X-ray phase contrast imaging ［J］. Microelectronic Engineering, 2007, 84(5-8): 1172-1177.

[7] [7] HEILMANN R K, DAVIS J E, DEWEY D, et al.. Critical-angle transmission grating spectrometer for high-resolution soft x-ray spectroscopy on the international X-ray observatory ［J］. SPIE, 2010, 7732: 77321J.

[8] [8] GE J, BERNECKER J L, MCDAVITT D L, et al.. Silicon anamorphic immersion gratings for IR high-resolution spectroscopy with future giant telescopes ［J］. SPIE, 2003, 4840: 624-633.

[9] [9] SHENG B, XU X D, LIU Y, et al.. Vacuum-ultraviolet blazed silicon grating anisotropically etched in KOH solution ［J］. Opt. Precision Eng., 2010, 18(1): 94-99. (in Chinese)

[10] [10] ZHENG Y CH. Fabrication of High Groove Density Freestanding X-ray Blazed Transmission Gratings ［D］. Hefei: University of Science and Technology of China, 2015. (in Chinese)

[11] [11] AHN M, HEILMANN R K, SCHATTENBURG M L. Fabrication of 200 nm period blazed transmission gratings on silicon-on-insulator wafers ［J］. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2008, 26(6): 2179-2182.

[12] [12] LI X J, CHEN Y, QIU K Q, et al.. Multiple centimetre-long fluidic-channels with smooth and vertical sidewall fabricated by novel NIL mould and thermal bonding ［J］. Microelectronic Engineering, 2012, 98: 720-724.

[13] [13] WANG Y, LIU ZH K, ZHENG Y CH, et al.. High-accuracy alignment of the grating pattern along silicon〈112〉 directions using a short rectangular array ［J］. Journal of Micromechanics and Microengineering, 2017, 27(6): 065008.

[14] [14] JAMES T D, PARISH G, WINCHESTER K J, et al.. A crystallographic alignment method in silicon for deep, long microchannel fabrication ［J］. Journal of Micromechanics and Microengineering, 2006, 16(10): 2177-2182.

[15] [15] ZHENG Y CH, QIU K Q, CHEN H Y, et al.. Alignment method combining interference lithography with anisotropic wet etch technique for fabrication of high aspect ratio silicon gratings ［J］. Optics Express, 2014, 22(19): 23592-23604.

[16] [16] SEIDEL H, CSEPREGI L. Design optimization for cantilever-type accelerometers ［J］. Sensors and Actuators, 1984, 6(2): 81-92.

[17] [17] WANG J, SUN Y M, HUANG Q A, et al.. Research development on wet anisotropic etching mechanism of crystal silicon ［J］. Chemical Industry Times, 2004, 18(6): 1-4, 24. (in Chinese)

[18] [18] UENISHI Y, TSUGAI M, MEHREGANY M. Micro-opto-mechanical devices fabricated by anisotropic etching of ［110］ silicon［C］. IEEE, Proceedings of 1994 IEEE Workshop on Micro Electro Mechanical Systems, 1995: 319-324.

[19] [19] AHN M. Fabrication of Critical-angle Transmission Gratings for High Efficiency X-ray Spectroscopy ［D］. Massachusetts: Massachusetts Institute of Technology, 2009.